Comparison of light emission from stain-etch and anodic-etch silicon films
Year: 1992
Type: article
Source: Applied Physics Letters
DOI: 10.1063/1.108041
Authors: J. N. Kidder, P. S. Williams, T. P. Pearsall, D. T. Schwartz, Brett Z. Nosho
Institution: University of Washington
Language: English
Subfield: Materials Chemistry
Field: Materials Science
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W1978701358