Work

High on/off-ratio P-type oxide-based transistors integrated onto Cu-interconnects for on-chip high/low voltage-bridging BEOL-CMOS I/Os

Year: 2012

Type: conference-paper

Source: Technical digest - International Electron Devices Meeting/Technical digest

DOI: 10.1109/iedm.2012.6479070

Authors: H. Sunamura, K. Kaneko, N. Furutake, S. Saito, M. Narihiro, N. Ikarashi, M. Hane, Y. Hayashi

Institution: Renesas Electronics (Japan)

Language: English

Topic: Thin-Film Transistor Technologies

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1998328381

FWCI: 0.81

Cites: 3

Cited by: 10

Related to: 10