Work

Extension of Far UV spectroscopic ellipsometry studies of High-κ dielectric films to 130 nm

Year: 2010

Type: article

Source: Thin Solid Films

DOI: 10.1016/j.tsf.2010.12.080

Authors: Vimal K. Kamineni, James N. Hilfiker, John L. Freeouf, Steve Consiglio, Robert Clark, Gert J. Leusink, Alain C. Diebold

Institutions: University at Albany, State University of New York, J.A. Woollam Company (United States), Portland State University

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1999685136

FWCI: 0.49

Cites: 20

Cited by: 12

Related to: 10