Work

Bulk FinFET junction isolation by heavy species and thermal implants

Year: 2014

Type: conference-paper

Source: International Conference on Ion Implantation Technology

DOI: 10.1109/iit.2014.6939998

Authors: Fareen Adeni Khaja, Hans-Joachim L. Gossmann, Benjamin Colombeau, Thirumal Thanigaivelan

Institution: Applied Materials (United States)

Language: English

Topic: Advancements in Semiconductor Devices and Circuit Design

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2000304124

FWCI: 1.204

Cites: 13

Cited by: 10

Related to: 10