Thin BaHfO3 high-k dielectric layers on TiN for memory capacitor applications
Year: 2008
Type: article
Source: Applied Physics Letters
DOI: 10.1063/1.2842426
Authors: G. Lupina, G. Kozłowski, J. Dabrowski, Ch. Wenger, P. Dudek, P. Zaumseil, G. Lippert, Ch. Walczyk, H.-J. Müssig
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2003265539