Work

First investigation of metal–insulator–metal (MIM) capacitor using Pr2O3 dielectrics

Year: 2004

Type: article

Source: Materials Science in Semiconductor Processing

DOI: 10.1016/j.mssp.2004.09.018

Authors: Ch. Wenger, J. Dąbrowski, P. Zaumseil, R. Sorge, P. Formanek, G. Lippert, H.-J. Müssig

Institution: Leibniz Institute for High Performance Microelectronics

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2004249710

FWCI: 6.648

Cites: 11

Cited by: 50

Related to: 10