Work

Lateral damage extension during masked ion implantation into GaAs

Year: 1996

Type: article

Source: Journal of Applied Physics

DOI: 10.1063/1.363378

Authors: M. M. Faye, C. Vieu, G. Ben Assayag, Ph. Salles, A. Claverie

Institutions: Cheikh Anta Diop University, Centre National de la Recherche Scientifique, Centre d’Élaboration de Matériaux et d’Études Structurales

Language: English

Topic: Ion-surface interactions and analysis

Subfield: Surfaces, Coatings and Films

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2004306926

FWCI:

Cites: 13

Cited by: 4

Related to: 10