Work

Characterization of an ultrashallow junction structure using angle resolved x-ray photoelectron spectroscopy and medium energy ion scattering

Year: 2008

Type: article

Source: Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

DOI: 10.1116/1.2834689

Authors: G. Saheli, G. Conti, Y. Uritsky, M. A. Foad, C. R. Brundle, P. Mack, D. Kouzminov, M. Werner, J. A. van den Berg

Institutions: Applied Materials (United States), Evans Analytical Group (United States), University of Salford

Language: English

Topic: Electron and X-Ray Spectroscopy Techniques

Subfield: Surfaces, Coatings and Films

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

Funder: Engineering and Physical Sciences Research Council

Award: The UK Medium Energy Ion Scattering Facility: Composition and Crystallography of Surfaces and Buried Interfaces

OpenAlex ID: W2005369511

FWCI: 0.87

Cites: 11

Cited by: 6

Related to: 10