Work

Raman scattering in low wavenumber region as a new probe to structural properties of microcrystalline silicon

Year: 1983

Type: article

Source: Journal of Non-Crystalline Solids

DOI: 10.1016/0022-3093(83)90287-9

Authors: Toshikazu Shimada, Yoshifumi Katayama, Kiyokazu Nakagawa, Hirokazu Matsubara, Masatoshi Migitaka, Eiichi Maruyama

Institution: Hitachi (Japan)

Language: English

Topic: Silicon and Solar Cell Technologies

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2013294871

FWCI: 1.105

Cites: 1

Cited by: 25

Related to: 10