Work

TEM Observation of Defects Induced by Cu Contamination on Si(100) Surface

Year: 1988

Type: article

Source: Japanese Journal of Applied Physics

DOI: 10.1143/jjap.27.l1819

Authors: Shinsuke Sadamitsu, Shigeo Sumita, Nobukatsu Fujino, Toshio Shiraiwa

Language: English

Topic: Semiconductor materials and interfaces

Subfield: Electronic, Optical and Magnetic Materials

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2013879995

FWCI: 1.555

Cites: 4

Cited by: 22

Related to: 10