Work

Critical reliability challenges in scaling SiO2-based dielectric to its limit

Year: 2003

Type: article

Source: Microelectronics Reliability

DOI: 10.1016/s0026-2714(03)00169-0

Authors: E.Y. Wu, J. Suñé, W. Lai, A. Vayshenker, E. Nowak, D. Harmon

Institutions: IBM (United States), Universitat Autònoma de Barcelona

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2014248132

FWCI: 4.302

Cites: 23

Cited by: 29

Related to: 10