Work

Intra-field on-product overlay improvement by application of RegC and TWINSCAN corrections

Year: 2015

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.2085651

Authors: Ofir Sharoni, Vladimir Dmitriev, Erez Graitzer, Yuval Perets, Kujan Gorhad, Richard van Haren, Hakki E. Cekli, Jan Mulkens

Institutions: Carl Zeiss (Israel), ASML (Netherlands)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2017204446

FWCI: 0.833

Cites: 7

Cited by: 4

Related to: 10