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Vladimir Dmitriev

Observed names: V. J. Dmitriev, Vladimir J. Dmitriev
Institution: Carl Zeiss (Israel)
OpenAlex ID: A5111584792
CD variations correction by local transmission control of photomasks done with a novel laser-based process
2006 · Eitan Zait, Vladimir Dmitriev, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 14
Correcting image placement errors using registration control (RegC) technology
2011 · Erez Graitzer, Gunter Antesberger, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 9
Irradiation resistance of intravolume shading elements embedded in photomasks used for CD uniformity control by local intra-field transmission attenuation
2006 · Eitan Zait, Guy Ben-Zvi, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 8
Co-optimization of RegC and TWINSCAN corrections to improve the intra-field on-product overlay performance
2016 · Kujan Gorhad, Ofir Sharoni, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7
Detection of progressive transmission loss due to haze with Galileo mask DUV transmittance mapping based on non imaging optics
2008 · Steven Labovitz, Guy Ben-Zvi, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7
In-field CD uniformity control by altering transmission distribution of the photomask using ultra-fast pulsed laser technology
2006 · Yasutaka Morikawa, Takanori Sutou, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7
The effect of intra-field CD uniformity control (CDC) on mask birefringence
2007 · Guy Ben-Zvi, Eitan Zait, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5
Photomask clear defects repair using ultrafast laser technology
2004 · Guy Ben-Zvi, Nikolay Guletsky, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5
Intra-field on-product overlay improvement by application of RegC and TWINSCAN corrections
2015 · Ofir Sharoni, Vladimir Dmitriev, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Closed loop registration control (RegC) using PROVE as the data source for the RegC process
2012 · Erez Graitzer, Avi Cohen, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Correcting image placement errors using registration control (RegC) technology in the photomask periphery
2012 · Avi Cohen, Falk Lange, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Improving mask registration and wafer overlay control using an ultrashort pulsed laser
2016 · Dan Avizemer, Vladimir Dmitriev, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 3
Compensating process non-uniformity to improve wafer overlay by RegC
2014 · Philippe Leray, Shaunee Cheng, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Very high sensitivity mask transmittance mapping and measurements based on non imaging optics with Galileo
2008 · Guy Ben-Zvi, Vladimir Dmitriev, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Mask CD control (CDC) with ultrafast laser for improving mask CDU using AIMS as the CD metrology data source
2007 · Guy Ben-Zvi, Eitan Zait, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Enhanced wafer overlay residuals control: deep sub-nanometer at sub-millimeter lateral resolution
2019 · Yael Sufrin, Philippe Leray, et al. · European Mask and Lithography Conference (EMLC) · 1
Enhanced wafer overlay residuals control; deep sub-nanometer at sub-millimeter lateral resolution
2019 · Avi Cohen, Philippe Leray, et al. · Metrology, Inspection, and Process Control XXXVI · 1
Further beyond: registration and overlay control enhancements for optical masks
2014 · Kujan Gorhad, Avi Cohen, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Mask CD control (CDC) using AIMS as the CD metrology data source
2008 · Guy Ben-Zvi, Eitan Zait, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Very high sensitivity mask DUV transmittance mapping and measurements based on non-imaging optics
2008 · Guy Ben-Zvi, Vladimir Dmitriev, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Optical design of ZEISS ForTune photo mask tuning system: how to generate diffraction-limited laser foci in thick specimens
2018 · Markus Seesselberg, Joachim Welte, et al. · SPIE Optical Design and Engineering
DUV attenuating structures in fused silica induced by ultrafsat laser radiation
2007 · Sergey Oshemkov, Vladimir Dmitriev, et al. · Conference on Lasers and Electro-Optics Europe & European Quantum Electronics Conference (CLEO/Europe-EQEC)
Quantum cooperative cluster: a new basic element for optical parallel computers
2002 · Sergei N. Bagayev, V. S. Egorov, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Works count: 23
Citation count: 90
H-index: 6
I10-index: 1
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