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Erez Graitzer
Institution:
Carl Zeiss (Israel)
Observed institution:
Carl Zeiss (Israel)
OpenAlex ID:
A5084585677
Correcting image placement errors using registration control (RegC) technology
2011
·
Erez Graitzer
, Gunter Antesberger
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
9
RegC: a new registration control process for photomasks after pattern generation
2011
·
Erez Graitzer
, Guy Ben-Zvi
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
7
Improved CD control for 45-40 nm CMOS logic patterning: anticipation for 32-28 nm
2010
·
Bertrand Le Gratiet
, Frank Sundermann
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
7
Detection of progressive transmission loss due to haze with Galileo mask DUV transmittance mapping based on non imaging optics
2008
·
Steven Labovitz
, Guy Ben-Zvi
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
7
CD uniformity correction on 45-nm technology non-volatile memory
2010
·
Ute Buttgereit
, Robert Birkner
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
6
Expanding the lithography process window (PW) with CDC technology
2009
·
Sz-Huei Wang
, Yu-Wan Chen
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
5
Intra-field on-product overlay improvement by application of RegC and TWINSCAN corrections
2015
·
Ofir Sharoni
, Vladimir Dmitriev
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
4
Improving wafer level CD uniformity for logic applications utilizing mask level metrology and process
2013
·
Avi Cohen
, Thomas Trautzsch
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
4
Closed loop registration control (RegC) using PROVE as the data source for the RegC process
2012
·
Erez Graitzer
, Avi Cohen
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
4
Correcting image placement errors using registration control (RegC) technology in the photomask periphery
2012
·
Avi Cohen
, Falk Lange
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
4
Process window improvement on 45nm technology non volatile memory by CD uniformity improvement
2010
·
Ute Buttgereit
, Robert Birkner
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
4
Compensating process non-uniformity to improve wafer overlay by RegC
2014
·
Philippe Leray
, Shaunee Cheng
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
3
Very high sensitivity mask transmittance mapping and measurements based on non imaging optics with Galileo
2008
·
Guy Ben-Zvi
, Vladimir Dmitriev
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
3
Mask CD control (CDC) with ultrafast laser for improving mask CDU using AIMS as the CD metrology data source
2007
·
Guy Ben-Zvi
, Eitan Zait
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
2
Mask tuning for process window improvement
2011
·
Ute Buttgereit
, Robert Birkner
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
1
レジストレーション制御(RegC)技術を用いた画像配置誤差補正
2011
·
Erez Graitzer
, Gunter Antesberger
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
1
Expanding the lithography process window (PW) with CDC technology
2009
·
Sz-Huei Wang
, Guy Ben-Zvi
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
1
Mask CD control (CDC) using AIMS as the CD metrology data source
2008
·
Guy Ben-Zvi
, Eitan Zait
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
1
Very high sensitivity mask DUV transmittance mapping and measurements based on non-imaging optics
2008
·
Guy Ben-Zvi
, Vladimir Dmitriev
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
1
Correcting image placement errors using registration control (RegC®) technology in the photomask periphery
2012
·
Avi Cohen
, Falk Lange
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
位置合わせ制御(RegC)技術を使ったフォトマスク周辺におけるイメージ配置誤差修正
2012
·
Cohen Avi
, Lange Falk
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
A study of closed-loop application: WLCD-CDC for 32nm and beyond reticles
2011
·
Arosha Goonesekera
, Ute Buttgereit
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Multiple layer CD control treatment
2009
·
Anka Birnstein
, Christoph Röpke
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Influence of symmetry on X-ray fluorescence
1976
·
A. Livnat
, Erez Graitzer
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Works count:
24
Citation count:
74
H-index:
5
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