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Correcting image placement errors using registration control (RegC®) technology in the photomask periphery

Year: 2012

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.980258

Authors: Avi Cohen, Falk Lange, Guy Ben-Zvi, Erez Graitzer, Dmitriev Vladimir

Institutions: Carl Zeiss (Israel), Advanced Mask Technology Center (Germany)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4241528352

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