Work

Study of Plasma Damage at Recess-Channel Gate (RG) Structure During Plasma Nitridation

Year: 2007

Type: conference-paper

Source: IEEE International Reliability Physics Symposium proceedings

DOI: 10.1109/relphy.2007.369917

Authors: Heung-Jae Cho, Tae-Yoon Kim, Se-Aug Jang, Hyun Ahn, Yong Soo Kim, Kwan-Yong Lim, Min Gyu Sung, Hong-Seon Yang, Seung-Ho Pyi, Jin Woong Kim

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2134752111

FWCI:

Cites:

Cited by: 1

Related to: 10