Work

Evaluation of high dose, high energy boron implantation into Cz substrates for epi-replacement in CMOS technology

Year: 2001

Type: article

Source: IEEE Transactions on Electron Devices

DOI: 10.1109/16.944194

Authors: K.K. Bourdelle, Yuanning Chen, R.A. Ashton, L.M. Rubin, A. Agarwal, W.H. Morris

Institutions: Axcelis Technologies (United States), Silicon Labs (United States)

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2136704138

FWCI: 3.156

Cites: 14

Cited by: 12

Related to: 10