Work

The RF-CV method for characterization of leaky gate dielectrics

Year: 2004

Type: article

Source: Microelectronic Engineering

DOI: 10.1016/j.mee.2004.01.028

Authors: J. Schmitz, F.N. Cubaynes, R. de Kort, R. Havens, A.J. Scholten, L.F. Tiemeijer

Institutions: Philips (Belgium), University of Twente, Philips (Netherlands)

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: bronze

OpenAlex ID: W2137203115

FWCI:

Cites: 8

Cited by: 2

Related to: 10