Work

SPICE parameter extraction and RO validation of a 65nm SOI technology

Year: 2008

Type: conference-paper

Source: IEEE International SOI Conference (SOI)

DOI: 10.1109/soi.2008.4656340

Authors: J.-S. Goo, Q. Chen, A. Pandey, Y. Apanovich, T. Ly, V. Wason, N. Subba, C. Thuruthiyil, A. B. Icel

Institution: Advanced Micro Devices (United States)

Language: English

Topic: Advancements in Semiconductor Devices and Circuit Design

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2139279808

FWCI:

Cites:

Cited by: 1

Related to: 10