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Sampling strategy: optimization and correction for high-order overlay control for 45nm process node

Year: 2009

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.812929

Authors: Bo Yun Hsueh, George K. C. Huang, Chun-Chi Yu, Chin-Chou Kevin Huang, Chien-Jen Huang, James R. Manka, David Tien

Institutions: United Microelectronics (Taiwan), KLA (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2145355652

FWCI: 0.937

Cites:

Cited by: 3

Related to: 10