Work

Extracting Mobility Degradation and Total Series Resistance of Cylindrical Gate-All-Around Silicon Nanowire Field-Effect Transistors

Year: 2009

Type: article

Source: IEEE Electron Device Letters

DOI: 10.1109/led.2009.2019977

Authors: Luryi Choi, Byoung Hak Hong, Young Chai Jung, Keun Hwi Cho, Kyoung Hwan Yeo, Dong-Won Kim, Gyo Young Jin, Kyung Seok Oh, Won-Seong Lee, Sang-Hun Song, Jae Sung Rieh, Dong Mok Whang, Sung Woo Hwang

Institutions: Korea University, Samsung (South Korea), Samsung Electronics (South Korea)

Language: English

Topic: Advancements in Semiconductor Devices and Circuit Design

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2168374686

FWCI: 1.546

Cites: 8

Cited by: 14

Related to: 10