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Spin-torque MRAM product status and technology for 40nm, 28nm and 22nm nodes

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Year: 2017
Type: conference-abstract
Source: IEEE International Magnetics Conference
DOI: 10.1109/intmag.2017.8007929
Authors: J.M. Slaughter, K. Nagel, R. Whig, S. Deshpande, S. Aggarwal, M. DeHerrera, J. Janesky, M. Lin, H. Chia, M. Hossain, S. Ikegawa, F. Mancoff, G. Shimon, J. Sun, M. Tran, T. Andre, S. Alam, F. Poh, J. Lee, Y. Chow, Y. Jiang, H. Liu, C. Wang, S. Noh, T. Tahmasebi, S. Ye, D. Shum
Institutions: Everspin Technologies (United States), GlobalFoundries (Singapore)
Language: English

Topic: Magnetic properties of thin films
Subfield: Atomic and Molecular Physics, and Optics
Field: Physics and Astronomy
Domain: Physical Sciences

Open Access status: closed
OpenAlex ID: W2744349596
Cites:
Cited by: 7
Related to: 10
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