Work

In-line XPS to quantify the changes in interfacial layers of advanced node gate stacks

Year: 2018

Type: conference-paper

Source: ASMC proceedings

DOI: 10.1109/asmc.2018.8373182

Authors: M. Medikonda, B. Kannan, B. Cohen, V. Chhabra, K. Onishi, G. Dilliway, A.F. Bello, M. Klare

Institution: Nova Measuring Instruments (United States)

Language: English

Topic: Electron and X-Ray Spectroscopy Techniques

Subfield: Surfaces, Coatings and Films

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2808522252

FWCI:

Cites: 6

Cited by: 1

Related to: 10