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Manasa Medikonda

Multi-technique x-ray and optical characterization of crystalline phase, texture, and electronic structure of atomic layer deposited Hf1−xZrxO2 gate dielectrics deposited by a cyclical deposition and annealing scheme
2013 · Relja Vasić, Steven Consiglio, et al. · Journal of Applied Physics · 27
Fabrication of 5-20 nm thick β-W films
2014 · Avyaya J. Narasimham, Manasa Medikonda, et al. · AIP Advances · 24
Effects of stress on the dielectric function of strained pseudomorphic Si1−xGex alloys from 0 to 75% Ge grown on Si (001)
2012 · Gangadhara Raja Muthinti, Manasa Medikonda, et al. · Journal of Applied Physics · 22
OCD enhanced: implementation and validation of spectral interferometry for nanosheet inner spacer indentation
2021 · Daniel Schmidt, Curtis Durfee, et al. · Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV · 17
Mueller based scatterometry measurement of nanoscale structures with anisotropic in-plane optical properties
2013 · Gangadhara R. Muthinti, Manasa Medikonda, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 17
Understanding the Nanotechnology Revolution
2012 · Edward L. Wolf, Manasa Medikonda · Wiley eBooks · 17
Study of Lanthanum Diffusion in HfO2-Based High-k Gate Stack
2018 · Meng Zhu, Balaji Kannan, et al. · ECS Transactions · 15
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Measurement of periodicity and strain in arrays of single crystal silicon and pseudomorphic Si1−xGex/Si fin structures using x-ray reciprocal space maps
2014 · Manasa Medikonda, Gangadhara R. Muthinti, et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 15
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Optical properties of pseudomorphic Ge1−xSnx (x = 0 to 0.11) alloys on Ge(001)
2014 · Manasa Medikonda, Gangadhara R. Muthinti, et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 14
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Spectral interferometry for fully integrated device metrology
2023 · Daniel Schmidt, Manasa Medikonda, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 7
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Vertical travelling scatterometry for metrology on fully integrated devices
2022 · Daniel Schmidt, Manasa Medikonda, et al. · Metrology, Inspection, and Process Control XXXVI · 7
Mueller matrix optical scatterometry of Si fins patterned using directed self-assembly block copolymer line arrays
2014 · Dhairya Dixit, Manasa Medikonda, et al. · ASMC proceedings · 6
Full structure transistor process monitoring of boron and germanium in PFET EPI using in-line XPS
2019 · Jusang Lee, Ganesh Subramanian, et al. · Metrology, Inspection, and Process Control XXXVI · 4
Engineering crystallinity of atomic layer deposited gate stacks containing ultrathin HfO2 and a Ti-based metal gate: Effects of postmetal gate anneal and integration schemes
2014 · Steven Consiglio, Kandabara Tapily, et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 3
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Fin stress and pitch measurement using X-ray diffraction reciprocal space maps and optical scatterometry
2013 · A. C. Diebold, M. Medikonda, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Effect of Germanium Concentration on the Dielectric Function of Strained Si1-xGex Films
2012 · Manasa Medikonda, Gangadhara R. Muthinti, et al. · International Silicon-Germanium Technology and Device Meeting (ISTDM) · 2
In-line XPS metrology for area selective deposition processes on patterned structures
2026 · Manasa Medikonda, Linda Wangoh, et al. · Metrology, Inspection, and Process Control XXXVI · 1
Scatterometry-based methodologies for characterization of MRAM technology
2022 · Manasa Medikonda, Daniel Schmidt, et al. · Metrology, Inspection, and Process Control XXXVI · 1
In-line XPS to quantify the changes in interfacial layers of advanced node gate stacks
2018 · M. Medikonda, B. Kannan, et al. · ASMC proceedings · 1
Discovery, Invention, and Science in Human Progress
2012 · Prof. Edward L. Wolf, Manasa Medikonda · Wiley eBooks · 1
In-line XPS for advanced semiconductor manufacturing and metrology on fully integrated targets
2026 · Christopher J. Lee, Manasa Medikonda, et al. · Metrology, Inspection, and Process Control XXXVI
Evaluation of inline SIMS impact on device reliability and performance
2026 · Jander Cruz, Li Xiang, et al. · Metrology, Inspection, and Process Control XXXVI
Dummy Poly Gate Etch Clean Challenges in Advanced Nanosheet Devices
2025 · Sirish Rimal, Muthumanickam Sankarapandian, et al. · SSRN Electronic Journal
Study of Lanthanum Diffusion in HfO2-Based High-k Gate Stack
2018 · Meng Zhu, Balaji Kannan, et al. · ECS Meeting Abstracts
Copper process control with picosecond ultrasonic technology: A study
2016 · Shravanthi L Manikonda, Manasa Medikonda, et al. · ASMC proceedings
Works count: 39
Citation count: 204
H-index: 9
I10-index: 9
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