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Fabrication of nanowires with high aspect ratios utilized by dry etching with SF6:C4F8 and self-limiting thermal oxidation on Si substrate

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Year: 2010
Type: article
Source: Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena
DOI: 10.1116/1.3455498
Authors: Si-Young Park, Sandro J. Di Giacomo, R. Anisha, Paul R. Berger, Phillip E. Thompson, Ilesanmi Adesida
Institutions: The Ohio State University, Northrop Grumman (United States), United States Naval Research Laboratory, University of Illinois Urbana-Champaign
Language: English

Topic: Nanowire Synthesis and Applications
Subfield: Electronic, Optical and Magnetic Materials
Field: Materials Science
Domain: Physical Sciences

Open Access status: closed

Funders: National Science Foundation, Ohio State University
OpenAlex ID: W57032373
FWCI: 0.525
Cites: 27
Cited by: 18
Related to: 10
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