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Christian K. Kalus

Observed names: C. K. Kalus, C. Kalus, C.K. Kalus, Christian K Kalus, Christian Kalus
OpenAlex ID: A5006177393
Efficient simulation of light diffraction from three-dimensional EUV masks using field decomposition techniques
2003 · Andreas Erdmann, Christian K. Kalus, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 27
Modification of boundaries conditions in the FDTD algorithm for EUV mask modeling
2002 · Alexandre Vial, Andreas Erdmann, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 14
Rigorous simulation of exposure over nonplanar wafers
2003 · Andreas Erdmann, Christian K. Kalus, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 12
Optimizing edge topography of alternating phase-shift masks using rigorous mask modeling
2000 · Christoph M. Friedrich, Leonhard Mader, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 12
Proximity correction using computer aided proximity correction (CAPROX): Evaluation and application
1991 · M. Hintermaier, U. Hofmann, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 12
Computer aided proximity correction for direct write E-beam lithography
1991 · E. Knapek, C.K. Kalus, et al. · Microelectronic Engineering · 8
Rigorous simulation of defective EUV multilayer masks
2003 · Christoph Sambale, Thomas Schmoeller, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7
Hierarchical proximity correction using CAPROX
1995 · Ulrich Hofmann, Christian K. Kalus, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7
Three dimensional mask effects in OPC process model development from first principles simulation
2008 · Lawrence S. Melvin III, Thomas Schmoeller, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6
Experimental and simulation comparison of electron-beam proximity correction
2004 · L. H. A. Leunissen, R. Jonckheere, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 6
Advanced application of hierarchy reorganisation in E-beam lithography
1996 · A. Rosenbusch, C.K. Kalus, et al. · Microelectronic Engineering · 4
Generic hierarchical engine for mask data preparation
2002 · Christian K. Kalus, Wolfgang Roessl, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Accuracy of new analytical models for resist formation lithography
2002 · Juriy Malov, Christian K. Kalus, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Benchmarking of available rigorous electromagnetic field (EMF) simulators for phase-shift mask applications
2001 · Christian K Kalus, Steffen List, et al. · Microelectronic Engineering · 2
On the way to 1 Gb: demonstration of e-beam proximity effect correction for mask making
1997 · Anja Rosenbusch, Christian K. Kalus, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Influence of residual gas composition and background pressure in a multi-stage co-evaporation chamber on the quality of Cu(In, Ga)Se2 thin films and their device performance
2016 · Dieter Greiner, Jakob Lauche, et al. · Conference record of the IEEE Photovoltaic Specialists Conference · 1
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In quest of predictive lithography simulation
2006 · Christian K. Kalus, Hinderk M. Buß, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Rigorous simulation of lithographic exposure of photoresist over a nonplanar wafer
2003 · Andreas Erdmann, Christian K. Kalus · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Elements of hierarchical mask data preparation
2002 · Christian K. Kalus, Michal Simecek · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Hierarchical e-beam proximity correction in mask making
1996 · Ulrich Hofmann, Christian K. Kalus, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Data Preparation
2005 · Paul J.M. van Adrichem, Christian Kalus · CRC Press eBooks
Towards systematic CD process control for e-beam lithography
2004 · Christian K. Kalus · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Application of lithography simulation in reticle inspection
2002 · Christian K. Kalus, Robert Wildfeuer · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Integrating real-time CD corrections into a laser pattern generator
2002 · Steven Haddleton, Lars Ivansen, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
FIRM: a new software tool for calibration of lithography simulation
1999 · Dietmar Krueger, Christian K. Kalus, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Works count: 25
Citation count: 130
H-index: 7
I10-index: 5
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