Product
Help
Pricing
About
Jobs
Log in
Get started
Author
Add to collection
Guido Salmaso
Observed name:
G. Salmaso
Observed institutions:
Istituto Nazionale di Fisica Nucleare,
Istituto Nazionale di Fisica Nucleare, Laboratori Nazionali di Legnaro,
ASML (Netherlands)
OpenAlex ID:
A5010742318
A Comparative Study of Cr2O3 Thin Films Obtained by MOCVD using Three Different Precursors
2005
·
G. Carta
, M. Natali
, et al.
·
Chemical Vapor Deposition
·
48
Chemical, morphological and nano-mechanical characterizations of Al2O3 thin films deposited by metal organic chemical vapour deposition on AISI 304 stainless steel
2005
·
M. Natali
, G. Carta
, et al.
·
Electrochimica Acta
·
37
Electrochemical anticorrosion performance evaluation of Al2O3 coatings deposited by MOCVD on an industrial brass substrate
2005
·
Francesca Guidi
, Giuseppe Moretti
, et al.
·
Electrochimica Acta
·
23
ASML NXE pellicle update
2019
·
Derk Brouns
, Par Broman
, et al.
·
Photomask and next-generation lithography mask technology. Conference
·
21
High-transmission EUV pellicles supporting >400W source power
2022
·
Mark A. van de Kerkhof
, Alexander Klein
, et al.
·
SPIE Optical and EUV Nanolithography
·
20
Effects of ion bombardment and gas incorporation on the properties of Mo/a-Si:H multilayers for EUV applications
2003
·
V. Rigato
, A. Patelli
, et al.
·
Surface and Coatings Technology
·
20
Structure and interface properties of Mo/B4C/Si multilayers deposited by rf-magnetron sputtering
2004
·
A. Patelli
, J. Ravagnan
, et al.
·
Applied Surface Science
·
19
0.33 NA EUV systems for high volume manufacturing
2023
·
Christophe Smeets
, Nico Benders
, et al.
·
SPIE Optical and EUV Nanolithography
·
17
Ion bombardment effects on nucleation of sputtered Mo nano-crystals in Mo/B4C/Si multilayers
2005
·
A. Patelli
, V. Rigato
, et al.
·
Surface and Coatings Technology
·
17
PDF
0.33 NA EUV systems for high-volume manufacturing
2022
·
Christophe Smeets
, Guido Salmaso
, et al.
·
SPIE Optical and EUV Nanolithography
·
10
A new generation EUV pellicle to enable future EUV lithographic nodes at enhanced productivity
2021
·
Guido Salmaso
, Raymond Maas
·
International Conference on Extreme Ultraviolet Lithography
·
10
Characterization of thermally treated Mo/Si multilayer mirrors with standing wave-assisted EXAFS
2006
·
M. Rovezzi
, F. D’Acapito
, et al.
·
Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms
·
7
Design and fabrication considerations of EUVL collectors for HVM
2009
·
G. Bianucci
, G. L. Cassol
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
4
Grazing-incidence reflectivity of Si-Au coatings for optics with high thermal load
2004
·
Luca Poletto
, Giampiero Naletto
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
4
Development of multilayer coatings for solar space experiments
2003
·
Maria-Guglielmina Pelizzo
, Alessandro Patelli
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
4
0.33 NA EUV systems for high-volume manufacturing
2022
·
Christophe Smeets
, Guido Salmaso
, et al.
·
International Conference on Extreme Ultraviolet Lithography
·
3
Technologies for manufacturing of high angular resolution multilayer coated optics for future new hard x-ray missions: a status report
2009
·
G. Borghi
, D. Vernani
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
3
Enabling deposition of hard x-ray reflective coatings as an industrial manufacturing process
2009
·
Denis Garoli
, Enrico Boscolo Marchi
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
2
0.33 NA EUV systems for high-volume manufacturing
2025
·
Raymond Maas
, Peter Dhaeze
, et al.
·
International Conference on Extreme Ultraviolet Lithography
·
1
0.33 NA EUV systems for high-volume manufacturing
2026
·
Guido Salmaso
, Claire van Lare
, et al.
·
SPIE Optical and EUV Nanolithography
Design and fabrication considerations of EUVL collectors for HVM
2009
·
Giovanni Bianucci
, G. L. Cassol
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Anticorrosion performance evaluation of Al2O3 coatings deposited by MOCVD on an industrial brass substrate
2003
·
Giuseppe Moretti
, Francesca Guidi
, et al.
·
ARCA (Università Ca' Foscari Venezia)
MOCVD deposition of metal-oxide coatings for wear and corrosion protection
2003
·
Guido Salmaso
, V. Rigato
, et al.
·
ARCA (Università Ca' Foscari Venezia)
Realizzazione e caratterizzazione di ottiche a multistrato per la radiazione nell'estremo ultravioletto e raggi X soffici
2000
·
Guido Salmaso
Show more works
View as search
Works count:
24
Citation count:
270
H-index:
10
I10-index:
11
Year
Topic
Type