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Peter Nikolsky

Observed name: P. Nikolsky
Institution: ASML (Netherlands)
OpenAlex ID: A5012519581
Development of layout split algorithms and printability evaluation for double patterning technology
2008 · Tsann-Bim Chiou, Robert Socha, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 37
Application challenges with double patterning technology (DPT) beyond 45 nm
2006 · Jungchul Park, Stephen Hsu, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 37
Litho and patterning challenges for memory and logic applications at the 22-nm node
2010 · Jo Finders, Mircea Dusa, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 21
Pattern split rules! A feasibility study of rule based pitch decomposition for double patterning
2007 · Anton van Oosten, Peter Nikolsky, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 14
Understanding advanced DRAM edge placement error budget and opportunities for control
2020 · Jaeseung Jeong, Jinho Lee, et al. · Metrology, Inspection, and Process Control XXXVI · 10
Feasibility study of the approach to flare, shadowing, optical and process corrections for EUVL OPC
2009 · Peter Nikolsky, Natalia Davydova, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5
Scanner-to-scanner CD analysis and control in an HVM environment
2017 · Du Hyun Beak, Ju Hee Shin, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Imaging challenges in 20nm and 14nm logic nodes: hot spots performance in Metal1 layer
2013 · V. Timoshkov, D. Rio, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Scanner-specific separable models for computational lithography
2008 · Stefan Hunsche, Xu Xie, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
OPC cycle time reduction and accuracy improvement by early access to advanced Tachyon modeling of TWINSCAN XT:1900i scanner
2008 · Peter Nikolsky, Tjitte Nooitgedagt, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Topological and Model Based approach to Native Conflicts correction and pitch decomposition for Double Patterning
2008 · Peter Nikolsky, Natalia Davydova, et al. · ASMC proceedings · 4
Mask characterization for CDU budget breakdown in advanced EUV lithography
2012 · Peter Nikolsky, Chris Strolenberg, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Topological and model based approach to pitch decomposition for double patterning
2008 · Peter Nikolsky, Natalia Davydova, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
CDU budget breakdown as a diagnostic method for imaging sensitivity in HVM
2016 · Young Ki Kim, Pavan Samudrala, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
CD uniformity optimization at volume ramp up stage for new product introduction
2014 · Jin-Soo Kim, Won-Kwang Ma, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Mask characterization for critical dimension uniformity budget breakdown in advanced extreme ultraviolet lithography
2013 · Peter Nikolsky, Chris Strolenberg, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 2
Large field of view metrology: detecting critical edge placement error signatures not seen with small field of view in an HVM environment
2023 · Mohamed Ridane, Ivy Chen, et al. · Metrology, Inspection, and Process Control XXXVI · 1
Improved model predictability by machine data in computational lithography and application to laser bandwidth tuning
2009 · Stefan Hunsche, Qian Zhao, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
LER characterization and impact on 0.13-μm lithography for OPC modeling
2004 · Peter Nikolsky, Rama Tweg, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
OPC Accuracy and Development Time Improvement for Advanced Technology Nodes
2009 · Peter Nikolsky, Tjitte Nooitgedagt, et al. · ECS Transactions
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A complementary lithographic simulation method for improved yields following full-chip DRC
2004 · Peter Nikolsky, Rama Tweg, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Works count: 21
Citation count: 159
H-index: 5
I10-index: 5
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