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Masaaki Matsukuma
Observed names:
M Matsukuma,
M. Matsukuma,
Matsukuma Masaaki,
Matsukuma, M.,
Matsukuma, Masaaki
Institutions:
Tokyo Electron (Japan),
Tokyo Electron Technology Solutions Limited (Japan)
Observed institutions:
Tokyo Electron (Japan),
Kyushu University,
Tokyo Electron Technology Solutions Limited (Japan),
The University of Osaka
ORCID:
0000-0002-1744-6450
Observed ORCID:
0000-0002-1744-6450
OpenAlex ID:
A5017673564
Spatiotemporal structure of low frequency waves in a magnetized plasma device
2003
·
M. Matsukuma
, Th. Pierre
, et al.
·
Physics Letters A
·
37
Multiscale plasma and feature profile simulations of plasma-enhanced chemical vapor deposition and atomic layer deposition processes for titanium thin film fabrication
2019
·
Kazuki Denpoh
, Paul Moroz
, et al.
·
Japanese Journal of Applied Physics
·
25
Modeling of very high frequency large-electrode capacitively coupled plasmas with a fully electromagnetic particle-in-cell code
2023
·
D Eremin
, E Kemaneci
, et al.
·
Plasma Sources Science and Technology
·
21
Dissipative particle dynamics study on directed self-assembly in holes
2013
·
T. Nakano
, M. Matsukuma
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
17
Experimental and numerical analysis of the effects of ion bombardment in silicon oxide (SiO 2 ) plasma enhanced atomic layer deposition (PEALD) processes
2020
·
Hu Li
, Tomoko Ito
, et al.
·
Japanese Journal of Applied Physics
·
14
PDF
Surface oxidation model in plasma enhanced atomic layer deposition for silicon oxide films including various aminosilane precursors
2019
·
Kosuke Yamamoto
, Ayuta Suzuki
, et al.
·
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
·
7
Molecular dynamics simulation of microcrystalline Si deposition processes by silane plasmas
2007
·
Masaaki Matsukuma
, Satoshi Hamaguchi
·
Thin Solid Films
·
7
Numerical strategy for solving the Boltzmann equation with variable E/N using physics-informed neural networks
2023
·
Jin Seok Kim
, Kazuki Denpoh
, et al.
·
Journal of Physics D Applied Physics
·
4
Observation of Chaotic Behavior Caused by Ion-Ion Instability
2000
·
Masaaki Matsukuma
, Kenta Kaimoto
, et al.
·
Journal of the Physical Society of Japan
·
4
Ion impact ionization in capacitively coupled Ar plasma captured using GPU-parallelized particle-in-cell, Monte Carlo collision simulation with a comprehensive ion-neutral reactive collision model
2025
·
Kazuki Denpoh
, Jin Seok Kim
, et al.
·
Japanese Journal of Applied Physics
·
3
Extension of ion-neutral reactive collision model DNT+ to polar molecules based on average dipole orientation theory
2024
·
Kazuki Denpoh
, Taiki Kato
, et al.
·
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
·
3
Measurements of spatial distributions of electron density and temperature of 450 MHz UHF plasma using laser Thomson scattering
2020
·
Yiming Pan
, Kentaro Tomita
, et al.
·
Japanese Journal of Applied Physics
·
3
PDF
Modelling of Plasma Surface Interaction
2007
·
Satoshi Hamaguchi
, Masashi Yamashiro
, et al.
·
Journal of Physics Conference Series
·
2
Nonlinear Saturation Mechanism of Ion–Ion Instability Due to Particle Trapping Effect
2001
·
Masaaki Matsukuma
, Yoshinobu Kawai
·
Journal of the Physical Society of Japan
·
2
Origins of intrinsic stress in disordered carbon materials: A first-principles study
2026
·
Yusuke Ando
, Hu Li
, et al.
·
Physical review. B./Physical review. B
·
1
Time evolution of electrode voltage distribution in large-area capacitively coupled plasmas
2006
·
Masaaki Matsukuma
, Satoshi Hamaguchi
·
Thin Solid Films
·
1
Non-Maxwellian shape of electron distribution function in ion acoustic turbulence
2001
·
E. Farshi
, T. Fukuyama
, et al.
·
IEEE Transactions on Plasma Science
·
1
Molecular dynamics insights into flowable chemical vapor deposition: Gap-fill mechanisms and transport properties
2026
·
Hu Li
, Takeo Nakano
, et al.
·
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
Monte Carlo simulation of fast neutrals produced and transported in a dual-frequency capacitively coupled Ar/CF 4 plasma sheath
2026
·
Kazuki Denpoh
, Masaaki Matsukuma
·
Japanese Journal of Applied Physics
Enhanced Vertical Conductivity in Few-layer Graphene and Graphite with Transition Metal Intercalation: a Theoretical Study
2020
·
Zeyuan Ni
, Takashi Matsumoto
, et al.
·
IEEE International Interconnect Technology Conference (IITC)
Hybrid molecular dynamics simulation for plasma induced damage analysis
2016
·
Masaaki Matsukuma
·
Bulletin of the American Physical Society
Influence of the normal modes on the plasma uniformity in large scale CCP reactors
2016
·
Denis Eremin
, Ralf Peter Brinkmann
, et al.
·
Bulletin of the American Physical Society
A PIC-MCC plasma model created on COMSOL Multiphysics
2016
·
Ayuta Suzuki
, Satoru Kawaguchi
, et al.
·
The Japan Society of Applied Physics
Mechanisms of Hydrocarbon Based Polymer Etch
2015
·
Barton Lane
, Peter L. G. Ventzek
, et al.
·
Bulletin of the American Physical Society
Damage formation mechanisms of Si and Ge substrates by ion bombardment
2015
·
Masaaki Matsukuma
, T. Morimoto
, et al.
·
Bulletin of the American Physical Society
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Works count:
37
Citation count:
152
H-index:
7
I10-index:
5
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