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G. A. Antonelli

Observed names: Antonelli, George, G A Antonelli, G. Andrew Antonelli, G. Anthony Antonelli, G.A. Antonelli, G.Andrew Antonelli, George Andrew Antonelli, George A. Antonelli, George Andrew Antonelli, George Antonelli
Observed institutions: New York State Department of Transportation, Intel (United States), University of Wisconsin–Madison, Davidson College, Applied Materials (United States), Brown University, University at Albany, State University of New York, Center for Nanoscale Science and Technology, IBM Research - Thomas J. Watson Research Center, NanoXplore (Canada), John Wiley & Sons (United States), Onto Innovation (United States), Lam Research (United States), Micro Focus (United States), Laboratoire Nanotechnologies et Nanosystèmes, Instituto Tecnológico de Tehuacán, Instituto Tecnológico Superior de Huauchinango, Instituto Tecnológico de Mazatlán, Instituto Tecnológico Superior de Teziutlán, Stanford University
ORCID: 0000-0002-8536-2750
Observed ORCID: 0000-0002-8536-2750
OpenAlex ID: A5045344070
Measurement of bandgap energies in low-k organosilicates
2014 · M. T. Nichols, W. Li, et al. · Journal of Applied Physics · 133
Picosecond ultrasonics study of the vibrational modes of a nanostructure
2002 · G. Andrew Antonelli, Humphrey J. Maris, et al. · Journal of Applied Physics · 99
Characterization of Mechanical and Thermal Properties Using Ultrafast Optical Metrology
2006 · G. Andrew Antonelli, Bernard Perrin, et al. · MRS Bulletin · 93
Oxygen radical and plasma damage of low-k organosilicate glass materials: Diffusion-controlled mechanism for carbon depletion
2009 · M. A. Goldman, D. B. Graves, et al. · Journal of Applied Physics · 76
The effects of vacuum ultraviolet radiation on low-k dielectric films
2012 · H. Sinha, H. Ren, et al. · Journal of Applied Physics · 42
Optical pump-probe measurements of sound velocity and thermal conductivity of hydrogenated amorphous carbon films
2008 · J. L. Arlein, S. E. M. Palaich, et al. · Journal of Applied Physics · 41
Time-dependent dielectric breakdown of plasma-exposed porous organosilicate glass
2012 · M. T. Nichols, H. Sinha, et al. · Applied Physics Letters · 35
Plasma damage effects on low-k porous organosilicate glass
2010 · H. Ren, G. A. Antonelli, et al. · Journal of Applied Physics · 34
Simple bond energy approach for non-destructive measurements of the fracture toughness of brittle materials
2007 · S.W. King, G.A. Antonelli · Thin Solid Films · 34
Brillouin light scattering studies of the mechanical properties of ultrathin low-k dielectric films
2006 · A. Link, R. Sooryakumar, et al. · Journal of Applied Physics · 32
Picosecond ultrasonic experiments with water and its application to the measurement of nanostructures
2010 · F. Yang, T. J. Grimsley, et al. · Journal of Applied Physics · 31
Charge Trapping within UV and Vacuum UV Irradiated Low-k Porous Organosilicate Dielectrics
2010 · J. L. Lauer, H. Sinha, et al. · Journal of The Electrochemical Society · 31
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Optical pump and probe measurement of the thermal conductivity of low-k dielectric thin films
2002 · Brian C. Daly, Humphrey J. Maris, et al. · Journal of Applied Physics · 30
Hydrogen effects on the thermal conductivity of delocalized vibrational modes in amorphous silicon nitride ( a − SiN x : H )
2021 · Jeffrey L. Braun, Sean W. King, et al. · Physical Review Materials · 27
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Efficient pump-probe sampling with a single-cavity dual-comb laser: Application in ultrafast photoacoustics
2022 · J. Pupeikis, W. Hu, et al. · Photoacoustics · 24
Nondestructive characterization of nanoscale subsurface features fabricated by selective etching of multilayered nanowire test structures using Mueller matrix spectroscopic ellipsometry based scatterometry
2020 · Madhulika Korde, Subhadeep Kal, et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 23
Effect of vacuum ultraviolet and ultraviolet Irradiation on capacitance-voltage characteristics of low-k-porous organosilicate dielectrics
2010 · H. Sinha, J. L. Lauer, et al. · Applied Physics Letters · 22
New method for the generation of surface acoustic waves of high frequency
2002 · G.Andrew Antonelli, Peter Zannitto, et al. · Physica B Condensed Matter · 22
Patterning with Amorphous Carbon Thin Films
2011 · George A. Antonelli, Sirish Reddy, et al. · ECS Transactions · 21
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Effects of vacuum ultraviolet radiation on deposited and ultraviolet-cured low-k porous organosilicate glass
2011 · H. Sinha, G. A. Antonelli, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 18
Defects in low-k organosilicate glass and their response to processing as measured with electron-spin resonance
2011 · H. Ren, M. T. Nichols, et al. · Applied Physics Letters · 18
Synergistic combinations of dielectrics and metallization process technology to achieve 22nm interconnect performance targets
2011 · G.A. Antonelli, G. Jiang, et al. · Microelectronic Engineering · 17
The nature of the defects generated from plasma exposure in pristine and ultraviolet-cured low-k organosilicate glass
2011 · H. Ren, G. Jiang, et al. · Applied Physics Letters · 16
Surface potential due to charge accumulation during vacuum ultraviolet exposure for high-k and low-k dielectrics
2010 · H. Ren, H. Sinha, et al. · Applied Physics Letters · 15
A detailed experimental and analytical study of the thermal expansion of dielectric thin films on Si by x-ray reflectivity
2006 · T. M. Phung, D. C. Johnson, et al. · Journal of Applied Physics · 15
Works count: 80
Citation count: 1,106
H-index: 19
I10-index: 30
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