Author

Christian D. Zuniga

Observed name: Christian Zuniga

Observed institutions: ASML (United States), Mentor Graphics (United States)

OpenAlex ID: A5057893119

Accurate 3DEMF mask model for full-chip simulation

2013 · Michael C. Lam, Kostas Adam, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 19

OPC modeling and correction solutions for EUV lithography

2011 · James Word, Christian Zuniga, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 15

EUV flare and proximity modeling and model-based correction

2011 · Christian Zuniga, Mohamed Habib, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 15

Resist toploss modeling for OPC applications

2014 · Christian Zuniga, Yunfei Deng · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 9

Development of a computational lithography roadmap

2008 · J. Fung Chen, Hua-Yu Liu, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 9

Resist profile modeling with compact resist model

2015 · Christian Zuniga, Yunfei Deng, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7

3D mask modeling for EUV lithography

2012 · Julien Mailfert, Christian Zuniga, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7

The trade-offs between thin and thick absorbers for EUV photomasks

2011 · Gregory McIntyre, Christian Zuniga, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7

Heuristics for truncating the number of optical kernels in Hopkins image calculations for model-based OPC treatment

2007 · Christian Zuniga, Edita Tejnil · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7

Modeling metrology for calibration of OPC models

2016 · Chris A. Mack, Ananthan Raghunathan, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6

Resist toploss and profile modeling for optical proximity correction applications

2014 · Christian D. Zuniga, Yunfei Deng · Journal of Micro/Nanopatterning Materials and Metrology · 4

Validation of a fast and accurate 3D mask model for SRAF printability analysis at 32nm node

2007 · Peng Liu, Christian Zuniga, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4

OPC model prediction capability improvements by accounting for mask 3D-EMF effects

2012 · Jacky Cheng, Jessy Schramm, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3

EUV OPC for 56nm metal pitch

2011 · Martin Burkhardt, Matt Colburn, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3

New approach to determine best beam focus

2009 · Christian Zuniga, Tamer M. Tawfik · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3

Rapid, accurate improvement in 3D mask representation via input geometry optimization and crosstalk

2014 · David Fryer, Michael Lam, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2

Singular Value Decomposition for Imaging Applications

2021 · Christian D. Zuniga · SPIE eBooks · 1

A model-based approach for the scattering-bar printing avoidance

2018 · Jingjing Zhang, Feng Shao, et al. · SPIE Optical Microlithography · 1

FinFET-induced anisotropy in printing of implantation shapes

2017 · Xiren Wang, Yuri Granik, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

Modeling laser bandwidth for OPC applications

2009 · Christian Zuniga, Kostas Adam, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

Singular Value Decomposition for Imaging Applications

2021 · Christian D. Zuniga · SPIE eBooks

Improved process window modeling techniques

2010 · Christian Zuniga, Tamer Tawfik · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Works count: 22

Citation count: 124

H-index: 7

I10-index: 3