Author

Guy Ben-Zvi

Observed names: Ben‐Zvi Guy, G. Ben-Zvi

Observed institution: Carl Zeiss (Israel)

OpenAlex ID: A5061009130

CD variations correction by local transmission control of photomasks done with a novel laser-based process

2006 · Eitan Zait, Vladimir Dmitriev, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 14

Correcting image placement errors using registration control (RegC) technology

2011 · Erez Graitzer, Gunter Antesberger, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 9

Irradiation resistance of intravolume shading elements embedded in photomasks used for CD uniformity control by local intra-field transmission attenuation

2006 · Eitan Zait, Guy Ben-Zvi, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 8

RegC: a new registration control process for photomasks after pattern generation

2011 · Erez Graitzer, Guy Ben-Zvi, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7

Detection of progressive transmission loss due to haze with Galileo mask DUV transmittance mapping based on non imaging optics

2008 · Steven Labovitz, Guy Ben-Zvi, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7

In-field CD uniformity control by altering transmission distribution of the photomask using ultra-fast pulsed laser technology

2006 · Yasutaka Morikawa, Takanori Sutou, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7

Expanding the lithography process window (PW) with CDC technology

2009 · Sz-Huei Wang, Yu-Wan Chen, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5

The effect of intra-field CD uniformity control (CDC) on mask birefringence

2007 · Guy Ben-Zvi, Eitan Zait, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5

Photomask clear defects repair using ultrafast laser technology

2004 · Guy Ben-Zvi, Nikolay Guletsky, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5

Correcting image placement errors using registration control (RegC) technology in the photomask periphery

2012 · Avi Cohen, Falk Lange, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4

Very high sensitivity mask transmittance mapping and measurements based on non imaging optics with Galileo

2008 · Guy Ben-Zvi, Vladimir Dmitriev, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3

Mask CD control (CDC) with ultrafast laser for improving mask CDU using AIMS as the CD metrology data source

2007 · Guy Ben-Zvi, Eitan Zait, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2

レジストレーション制御(RegC)技術を用いた画像配置誤差補正

2011 · Erez Graitzer, Gunter Antesberger, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

Intra field CD uniformity correction by Scanner Dose Mapper using Galileo mask transmission mapping as the CDU data source

2010 · Gek Soon Chua, Chason Eran, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

Expanding the lithography process window (PW) with CDC technology

2009 · Sz-Huei Wang, Guy Ben-Zvi, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

Mask CD control (CDC) using AIMS as the CD metrology data source

2008 · Guy Ben-Zvi, Eitan Zait, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

Very high sensitivity mask DUV transmittance mapping and measurements based on non-imaging optics

2008 · Guy Ben-Zvi, Vladimir Dmitriev, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

Correcting image placement errors using registration control (RegC®) technology in the photomask periphery

2012 · Avi Cohen, Falk Lange, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

位置合わせ制御(RegC)技術を使ったフォトマスク周辺におけるイメージ配置誤差修正

2012 · Cohen Avi, Lange Falk, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Multiple layer CD control treatment

2009 · Anka Birnstein, Christoph Röpke, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DUV attenuating structures in fused silica induced by ultrafsat laser radiation

2007 · Sergey Oshemkov, Vladimir Dmitriev, et al. · Conference on Lasers and Electro-Optics Europe & European Quantum Electronics Conference (CLEO/Europe-EQEC)

High-speed processing of transparent materials with ultrafast lasers

2006 · S. Oshemkov, V. Dmitriev, et al. · Conference on Lasers and Electro-Optics Europe & European Quantum Electronics Conference (CLEO/Europe-EQEC)

Works count: 22

Citation count: 81

H-index: 6

I10-index: 1