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Water Lur

Growth kinetics of amorphous interlayer formed by interdiffusion of polycrystalline Ti thin-film and single-crystal silicon
1989 · W. Lur, L. J. Chen · Applied Physics Letters · 90
Effective repair to ultra-low- k dielectric material ( k ∼2.0) by hexamethyldisilazane treatment
2002 · Y. S. Mor, T. C. Chang, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 80
Interfacial reactions of titanium thin films on BF+2 -implanted (001)Si
1989 · W. Lur, L. J. Chen · Journal of Applied Physics · 35
Interfacial reactions of cobalt thin films on BF+2 ion-implanted (001) silicon
1988 · W. Lur, L. J. Chen · Journal of Applied Physics · 28
Effects of a new combination of additives in electroplating solution on the properties of Cu films in ULSI applications
2000 · J. C. Hu, T. C. Chang, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 23
A novel 0.25 μm shallow trench isolation technology
2002 · C. Chen, J.W. Chou, et al. · Technical digest - International Electron Devices Meeting/Technical digest · 20
Trimethylchlorosilane Treatment of Ultralow Dielectric Constant Material after Photoresist Removal Processing
2002 · T. C. Chang, Y. S. Mor, et al. · Journal of The Electrochemical Society · 20
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Effects of silicide formation on the removal of end-of-range ion implantation damage in silicon
1989 · W. Lur, J.Y. Cheng, et al. · Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms · 19
Bond-structure changes of liquid phase deposited oxide (SiO2−xFx) on N2 annealing
1995 · Ching-Fa Yeh, Chun-Lin Chen, et al. · Applied Physics Letters · 13
The prevention of charge damage on thin gate oxide from high density plasma deposition
2003 · H.H. Shih, C.Y. Tsai, et al. · International Symposium on Plasma Process-Induced Damage · 8
The investigation of electroplating deposited copper films for advanced VLSI interconnection
2003 · H.C. Chen, M.S. Yang, et al. · IEEE International Interconnect Technology Conference (IITC) · 7
A fully planarized 6-level-metal CMOS technology for 0.25-0.18 micron foundry manufacturing
2002 · T. Lin, C. Chen, et al. · Technical digest - International Electron Devices Meeting/Technical digest · 6
Interfacial reactions of titanium thin films on ion implanted (001) Si
1993 · H.R. Liauh, M.C. Chen, et al. · Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms · 6
The applications of transmission electron microscopy to the characterization of metal thin films on silicon
1990 · L.J. Chen, W. Lur, et al. · Thin Solid Films · 5
Silicide Formation by Rapid Thermal Processing
1994 · L.J. Chen, W. Lur, et al. · MRS Proceedings · 4
Stress in Liquid‐Phase Deposited Oxide Films
1996 · Ching‐Fa Yeh, Shyue‐Shyh Lin, et al. · Journal of The Electrochemical Society · 3
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Thermal stability of TiSi2 on ion implanted silicon
1995 · J.F. Chen, L.J. Chen, et al. · Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms · 3
Removal of End-of-Range Ion Implantation Defects in Silicon by Near Noble and Refractory Silicide Formation
1989 · W. Lur, J. Y. Cheng, et al. · MRS Proceedings · 3
Shallow-Trench Isolation With Raised-Field-Oxide Structure
2000 · Coming Chen, Chun-Yen Chang, et al. · Japanese Journal of Applied Physics · 2
Interfacial Reactions of Titanium Thin Films on P+-Implanted (001)Si
1988 · M. H. Wan, W. Lur, et al. · MRS Proceedings · 2
Advanced 0.25-0.18 μm fully-planarized 6-level-interconnect CMOS technology for foundry manufacturing
2002 · T. Lin, C. Chen, et al. · Semiconductor Manufacturing Technology Workshop (SMTW)
Low temperature processed poly-Si thin-film transistors with thinner LPD-SiO/sub 2/ as gate insulator and its reliability
2002 · Ching-Lin Fan, Ching-Fa Yeh, et al.
New Contact Etch Process for Embedded DRAM Applications
1999 · Chan-Lon Yang, Tong-Yu Chen, et al. · MRS Proceedings
Low temperature processed poly-Si thin-film transistors with thinner LPD-SiO2 as gate insulator and its reliability
1995 · CL Fan, CF Yeh, et al.
Thermal Stability of TiSi2 on High Dose Ion Implanted Silicon
1993 · J.F. Chen, L.J. Chen, et al. · MRS Proceedings
Works count: 27
Citation count: 377
H-index: 9
I10-index: 9
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