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Maurits van der Schaar

Observed names: Maurits v. d. Schaar, Maurits van de Schaar
Institution: ASML (Netherlands)
Observed institution: ASML (Netherlands)
OpenAlex ID: A5105216633
Novel diffraction-based spectroscopic method for overlay metrology
2003 · Weidong Yang, Roger Lowe-Webb, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 48
Evaluation of a novel ultra small target technology supporting on-product overlay measurements
2012 · Henk-Jan H. Smilde, Arie den Boef, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 41
On-product overlay enhancement using advanced litho-cluster control based on integrated metrology, ultra-small DBO targets and novel corrections
2013 · Kaustuve Bhattacharyya, Chih-Ming Ke, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 28
New approaches for scatterometry-based metrology for critical distance and overlay measurement and process control
2011 · Kaustuve Bhattacharyya, Noelle Wright, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 23
Improving on-product performance at litho using integrated diffraction-based metrology and computationally designed device-like targets fit for advanced technologies (incl. FinFET)
2014 · Kai-Hsiung Chen, GT Huang, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 22
Evaluation of a new metrology technique to support the needs of accuracy, precision, speed, and sophistication in near-future lithography
2009 · Chih-Ming Ke, Jimmy Hu, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 19
Achieving optimum diffraction based overlay performance
2010 · Philippe Leray, David Laidler, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 13
Litho process control via optimum metrology sampling while providing cycle time reduction and faster metrology-to-litho turn around time
2011 · K.-H. Chen, Jacky Huang, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 11
Novel diffraction based overlay metrology utilizing phase-based overlay for improved robustness
2021 · Masazumi Matsunobu, Toshiharu Nishiyama, et al. · Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV · 8
A paradigm shift in scatterometry-based metrology solution addressing the most stringent needs of today as well as future lithography
2010 · C. M. Ke, Victor Shih, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 8
A comprehensive look at a new metrology technique to support the needs of lithography performance in near future
2008 · Jimmy Hu, Chih-Ming Ke, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 8
Sub-nanometer in-die overlay metrology: measurement and simulation at the edge of finiteness
2013 · Henk-Jan H. Smilde, Martin Jak, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7
A sophisticated metrology solution for advanced lithography: addressing the most stringent needs of today as well as future lithography
2009 · Victor Shih, Jacky Huang, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6
Eliminating the offset between overlay metrology and device patterns using computational metrology target design
2016 · Jianming Zhou, Sarah Wu, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Advances in process overlay
2001 · Paul C. Hinnen, Henry J. L. Megens, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Diffraction-based overlay for spacer patterning and double patterning technology
2011 · Byoung Hoon Lee, JeongSu Park, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Advances in process overlay on 300-mm wafers
2002 · Jens Staecker, Stefanie Arendt, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Model-based metrology of resist patterns in lithography
2011 · Arie den Boef, Hugo Cramer, et al. · Imaging and Applied Optics
Wafer alignment with backscatter electron detection
2003 · Hans Gijsbertsen, David Nijkerk, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Works count: 19
Citation count: 254
H-index: 8
I10-index: 8
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