Author

Deborah S. Gustafson

Observed names: Deborah Gustafson, Gustafson Deborah S

Observed institution: Energetiq Technology (United States)

OpenAlex ID: A5111799707

Extreme-ultraviolet light source development to enable pre-production mask inspection

2012 · Matthew Partlow, Matthew Besen, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 29

2008 · Paul A. Blackborow, Matthew J. Partlow, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 11

Application of the Energetiq EQ-10 electrodeless Z-Pinch EUV light source in outgassing and exposure of EUV photoresist

2007 · Paul A. Blackborow, Deborah S. Gustafson, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 11

High brightness electrodeless Z-Pinch EUV source for mask inspection tools

2012 · Stephen F. Horne, Matthew J. Partlow, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 8

Status report on EUV source development and EUV source applications in EUVL

2007 · Vivek Bakshi, Rainer Lebert, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6

Development of a high-pulse-rate EUV source

2009 · Stephen F. Horne, Fred M. Niell, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5

EUV source development for AIMS and blank inspection

2010 · Paul A. Blackborow, Matthew J. Partlow, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4

EQ-10 electrodeless Z-pinch EUV source for metrology applications

2011 · Deborah Gustafson, Stephen F. Horne, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3

Improvements in the EQ-10 electrodeless Z-pinch EUV source for metrology applications

2011 · Stephen F. Horne, Deborah Gustafson, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3

Laser-Driven Plasma Source Technology and Applications

2023 · Huiling Zhu, Toru Fujinami, et al. · SPIE eBooks · 2

The Electrode-less Z-pinch Metrology Source

2023 · Stephen Horne, Matthew J. Partlow, et al. · SPIE eBooks · 1

EUVフォトレジストの脱ガス及び露光時のEnergetiq EQ-10 Electrodeless Z-Pinch TM EUV光源の適用

2007 · Blackborow Paul A, Gustafson Deborah S, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

SXR development for metrology, inspection, and process control using a discharge-produced plasma source

2026 · Henry Chou, Nanu Brates, et al. · Metrology, Inspection, and Process Control XXXVI

High brightness tunable light source powered by LDLS facilitates diamond inspection

2025 · Xiaohua Ye, Nanu Brates, et al. · Photonic Instrumentation Engineering

Preparing for cost effective soft x-ray metrology for 3D chip architecture

2023 · Henry Chou, Don McDaniel, et al. · Advances in Metrology for X-Ray and EUV Optics

UV tunable light source and its potential applications for UVC virus inactivation research

2022 · Xiaohua Ye, William Grube, et al. · Photonic Instrumentation Engineering

The EQ-10 Electrodeless Z-Pinch™ Metrology Source

2018 · Stephen F. Horne, Matthew M. Besen, et al. · SPIE eBooks

Metrology Sources for EUV Lithography

2013 · Steve Horne, Paul Blackborow, et al. · Conference on Lasers and Electro-Optics

Works count: 19

Citation count: 84

H-index: 5

I10-index: 3