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M. S. Ameen

Effect of annealing environment on the memory properties of thin oxides with embedded Si nanocrystals obtained by low-energy ion-beam synthesis
2003 · P. Normand, E. Kapetanakis, et al. · Applied Physics Letters · 106
FinFET process refinements for improved mobility and gate work function engineering
2003 · Yang-Kyu Choi, Leland Chang, et al. · Technical digest - International Electron Devices Meeting/Technical digest · 106
Silicon nanocrystal memory devices obtained by ultra-low-energy ion-beam synthesis
2004 · P Dimitrakis, E Kapetanakis, et al. · Solid-State Electronics · 68
Electro-optic characterization of ion beam sputter-deposited KNbO3 thin films
1991 · T. M. Graettinger, S. H. Rou, et al. · Applied Physics Letters · 60
Bottom electrodes for integrated Pb(Zr, Ti)O3 films
1992 · Philip D. Hren, S. H. Rou, et al. · Integrated ferroelectrics · 51
Nanocrystals manufacturing by ultra-low-energy ion-beam-synthesis for non-volatile memory applications
2003 · P. Normand, E. Kapetanakis, et al. · Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms · 46
Tunable work function molybdenum gate technology for FDSOI-CMOS
2003 · P. Ranade, Yang-Kyu Choi, et al. · Technical digest - International Electron Devices Meeting/Technical digest · 45
Controlled ion beam sputter deposition of W/Cu/W layered films for microelectronic applications
1991 · O. Auciello, S. Chevacharoenkul, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 45
YBa2Cu3O7−δ films deposited by a novel ion beam sputtering technique
1989 · A. I. Kingon, O. Auciello, et al. · Applied Physics Letters · 38
Modulated ion beam studies of product formation and ejection in ion-induced etching of GaAs by Cl2
1988 · M. S. Ameen, T. M. Mayer · Journal of Applied Physics · 37
Processing and Structural Characterization of Ferroelectric Thin Films Deposited by Ion Beam Sputtering
1990 · M. S. Ameen, T. M. Graettinger, et al. · MRS Proceedings · 25
Computer-controlled ion beam deposition systems for high Tc superconductor and other multi-component oxide thin films and layered structures
1990 · A.R. Krauss, O. Auciello, et al. · Applied Surface Science · 24
Molybdenum-gate HfO/sub 2/ CMOS FinFET technology
2005 · D. Ha, H. Takeuchi, et al. · Technical digest - International Electron Devices Meeting/Technical digest · 23
Surface segregation during reactive etching of GaAs and InP
1986 · M. S. Ameen, T. M. Mayer · Journal of Applied Physics · 15
Elimination of poly-Si gate depletion for sub-65-nm CMOS technologies by excimer laser annealing
2005 · Hiu Yung Wong, H. Takeuchi, et al. · IEEE Electron Device Letters · 14
Effects of annealing conditions on charge storage of Si nanocrystal memory devices obtained by low-energy ion beam synthesis
2003 · P. Normand, E. Kapetanakis, et al. · Microelectronic Engineering · 14
Dose Rate Effects: the Impact of Beam Dynamics on Materials Issues and Device Performance
2008 · M. S. Ameen, M. A. Harris, et al. · AIP conference proceedings · 12
Processing-structure relations for ferroelectric thin films deposited by ion beam sputter deposition
1991 · Angus Kingon, Michael Ameen, et al. · Ferroelectrics · 12
SIMS study of ion assisted etching of Si by Cl2
1984 · D. J. Vitkavage, M. S. Ameen, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 11
Molecular effect on projected range in ultralow-energy ion implantation
2003 · K. Kimura, Y. Oota, et al. · Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms · 10
Characterization of a large volume electron cyclotron resonance plasma for etching and deposition of materials
1992 · A. Ghanbari, M. S. Ameen, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 10
Increase of Carbon Substitutionality and Silicon Strain by Molecular Ion Implantation
2007 · Andrei Li-Fatou, Amitabh Jain, et al. · ECS Transactions · 9
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Characterization of KNbO3Thin Films Deposited by Ion Beam Sputtering using a Computer-Controlled Rotating Target Holder
1989 · M. S. Ameen, T. M. Graettinger, et al. · MRS Proceedings · 9
Properties of ultralow energy boron implants using octadecaborane
2008 · M. S. Ameen, L. M. Rubin, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 8
Summary Abstract: Ion-enhanced processes in etching of silicon
1985 · T. M. Mayer, M. S. Ameen, et al. · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 8
Works count: 84
Citation count: 917
H-index: 14
I10-index: 21
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