Author

Qi-De Qian

Observed name: Qi-de Qian

Institution: Scope Group (United States)

Observed institutions: Intel (United States), Scope Group (United States)

OpenAlex ID: A5112523428

Laser alignment modeling using rigorous numerical simulations

1991 · Gregory L. Wojcik, David K. Vaughan, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 15

Effect of chromatic aberration in excimer laser lithography

1992 · Pei-yang Yan, Qi-De Qian, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 11

Effect of laser mask repair-induced residue and quartz damage in sub-half-micrometer DUV wafer processes

1995 · Pei-yang Yan, Qi-De Qian, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7

Advanced physical models for mask data verification and impacts on physical layout synthesis

2004 · Qi-De Qian, S.X.-D. Tan · International Symposium on Quality Electronic Design (ISQED) · 6

Effect of lens aberration on oblique-illumination stepper system

1993 · Pei-yang Yan, Qi-De Qian, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5

Study of the relationship between exposure margin and photolithographic process latitude and mask linearity

1991 · Steven G. Hansen, Giang T. Dao, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5

Controlling defocus impact on OPC performance

2003 · Shinichi Takase, Qi-De Qian · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4

Fast algorithms for 3D high-NA lithography simulation

1995 · Qi-De Qian, Francisco A. Leon · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4

Simulation-based defect printability analysis on attenuated phase-shifting masks

2002 · Linyong Pang, Qi-De Qian, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3

Defect printability analysis study using virtual stepper system in a production environment

2002 · Shao-Yung Chiou, Henrry Lei, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3

Focus latitude optimization for model-based OPC

2003 · Qi-De Qian, Shinichi Takase · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2

LithoScope: Simulation Based Mask Layout Verification with Physical Resist Model

2002 · Qi-De Qian · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2

Defect dispositioning using mask printability analysis on alternating phase-shifting masks

2002 · Chung-Hsing Chang, Chen-Hao Hsieh, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2

Modeling spray/puddle dissolution processes for deep-ultraviolet acid-hardened resists

1993 · John M. Hutchinson, Siddhartha Das, et al. · Optical Engineering · 2

Simulated performance of high na excimer laser stepper with chromatic lens design for 0.25.MU.m LITHOGRAPHY.

1993 · Pei-yang Yan, Qi-de Qian, et al. · Journal of Photopolymer Science and Technology · 2

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Defect printability analysis on alternating phase-shifting masks

2002 · Linyong Pang, Qi-De Qian, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

Impact of MEEF on low k 1 lithography and mask inspection

2000 · Qi-De Qian · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

Interferometric measurement of etch depths in phase-shift masks

1993 · Patrick M. Troccolo, Donald K. Cohen, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

DFM through correct process construction

2004 · Qi-De Qian · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

LithoScope: an advanced physical modeling system for mask layout data verification

2003 · Qi-De Qian · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Digital Image Processor for Complex Shape Metrology

2002 · Qi-De Qian · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Technological challenges in implementation of alternating phase-shift mask

2001 · Wilman Tsai, Qi-De Qian, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Predicting mask performance by numerical simulation

1995 · Qi-De Qian, Giang T. Dao, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Modeling spray/puddle dissolution processes for DUV acid-hardened resists

1992 · John M. Hutchinson, Siddhartha Das, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Electrical behavior of an inversion layer at aluminum(x)gallium(1-x)arsenide/gallium-arsenide heterojunction

1988 · Qi-De Qian · Purdue e-Pubs (Purdue University System)

Works count: 25

Citation count: 76

H-index: 5

I10-index: 2