Work

100-nm node lithography with KrF?

Year: 2001

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.435719

Authors: Michael Fritze, Brian Tyrrell, David K. Astolfi, Donna Yost, Paul Davis, Bruce Wheeler, Renee D. Mallen, J. Jarmolowicz, Susan G. Cann, Hua-Yu Liu, M. Ma, David Y. Chan, Peter D. Rhyins, Chris Carney, John E. Ferri, B. A. Blachowicz

Institutions: MIT Lincoln Laboratory, Photronics (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W2067401920

FWCI: 4.634

Cites:

Cited by: 11

Related to: 10