Work

Investigation of full-field CD control of sub-100-nm gate features by phase-shift 248-nm lithography

Year: 2001

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.436759

Authors: Michael Fritze, Brian Tyrrell, David K. Astolfi, Paul Davis, Bruce Wheeler, Renee D. Mallen, J. Jarmolowicz, Susan G. Cann, David Y. Chan, Peter D. Rhyins, Martin E. Mastovich, Neal T. Sullivan, Robert Brandom, Chris Carney, John E. Ferri, B. A. Blachowicz

Institutions: MIT Lincoln Laboratory, Photronics (United States), Schlumberger (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2079706469

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