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Sophie Bourtault

Observed name: S. Bourtault
Institution: Sopra (France)
Observed institution: Sopra (France)
OpenAlex ID: A5048829136
Infrared spectroscopic ellipsometry applied to the characterization of ultra shallow junction on silicon and SOI
2004 · C. Defranoux, T. Emeraud, et al. · Thin Solid Films · 7
Infrared spectroscopic ellipsometry in semiconductor manufacturing
2004 · Pierre-Yves Guittet, Ulrich Mantz, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
High-accuracy characterization of antireflective coatings and photoresists by spectroscopic ellipsometry: a new tool for 300-mm wafer technology
1999 · Pierre Boher, Christophe Defranoux, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Advanced metrology tool for Si/sub 1-x/Ge/sub x/ characterization: Infrared Spectroscopic Ellipsometer (IRSE)
2004 · D. Enicks, I-L Teng, et al. · ASMC proceedings
Characterization of ultra thin high K gate dielectrics by grazing x-ray reflectance and Spectroscopic Ellipsometry on the same instrument
2001 · P. Boher, J.-L. Stehle, et al. · European Solid-State Device Research Conference
High-accuracy characterization of antireflective coatings and photoresists by spectroscopic ellipsometry: a new tool for 300-mm-wafer technology
1999 · Pierre Boher, Christophe Defranoux, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Works count: 6
Citation count: 12
H-index: 2
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