Work

High-accuracy characterization of antireflective coatings and photoresists by spectroscopic ellipsometry: a new tool for 300-mm-wafer technology

Year: 1999

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.346910

Authors: Pierre Boher, Christophe Defranoux, Sophie Bourtault, Jean-Louis P. Stehle

Institution: Sopra (France)

Language: English

Topic: Optical Polarization and Ellipsometry

Subfield: Atomic and Molecular Physics, and Optics

Field: Physics and Astronomy

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W3205667635

FWCI:

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