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Th. Welzel

Physics and phenomena in pulsed magnetrons: an overview
2009 · J W Bradley, T Welzel · Journal of Physics D Applied Physics · 82
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Formation of c-BN thin films under reduced ion impact
1997 · J. Hahn, F. Richter, et al. · Surface and Coatings Technology · 62
Optical properties of nitrogen-rich carbon films deposited by d.c. magnetron sputtering
1997 · M. Friedrich, Th. Welzel, et al. · Diamond and Related Materials · 45
Ion distribution measurements to probe target and plasma processes in electronegative magnetron discharges. I. Negative ions
2011 · Th. Welzel, S. Naumov, et al. · Journal of Applied Physics · 34
Process diagnostics during the deposition of cubic boron nitride
1997 · R. Pintaske, Th. Welzel, et al. · Surface and Coatings Technology · 30
Ion distribution measurements to probe target and plasma processes in electronegative magnetron discharges. II. Positive ions
2011 · Th. Welzel, S. Naumov, et al. · Journal of Applied Physics · 22
AC powered reactive magnetron deposition of indium tin oxide (ITO) films from a metallic target
2006 · H. Kupfer, R. Kleinhempel, et al. · Surface and Coatings Technology · 22
A time-resolved Langmuir double-probe method for the investigation of pulsed magnetron discharges
2004 · Th. Welzel, Th. Dunger, et al. · Journal of Applied Physics · 21
Determination of radical densities by optical emission spectroscopy during the ECR plasma deposition of Si-C-N : H films using TMS as a precursor
2002 · Th Welzel, I Dani, et al. · Plasma Sources Science and Technology · 20
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Spectroscopic studies of a magnetron sputtering discharge for boron nitride deposition
1998 · R. Pintaske, Th. Welzel, et al. · Surface and Coatings Technology · 19
Spatial and temporal development of the plasma potential in differently configured pulsed magnetron discharges
2008 · Th Welzel, Th Dunger, et al. · New Journal of Physics · 17
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Time-resolved characterisation of pulsed magnetron discharges using Langmuir probes
2004 · F. Richter, Th. Welzel, et al. · Surface and Coatings Technology · 15
Comparison of the radio frequency hollow cathode to the microwave antenna discharge for plasma processing
2001 · L. Bárdoš, H. Baránková, et al. · Journal of Applied Physics · 14
Studies of the temporal behaviour of a pulsed magnetron deposition discharge
2005 · Th. Welzel, Th. Dunger, et al. · Surface and Coatings Technology · 13
Time Resolved Langmuir Probe Characterisation of Reactive Pulse Magnetron Sputtering of MgO Thin Films
2004 · F. Richter, T. Welzel, et al. · Surface Engineering · 13
Time-resolved investigation of an asymmetric bipolar pulsed magnetron discharge: Influence of pressure
2005 · Th. Dunger, Th. Welzel, et al. · Surface and Coatings Technology · 11
Reactive gas effects in pulsed magnetron sputtering: Time-resolved investigation
2006 · Th. Welzel, Th. Dunger, et al. · Surface and Coatings Technology · 10
Influence of aluminum additions on phase formation in boron nitride films deposited by magnetron sputtering
2003 · Th. Pfeifer, F. Richter, et al. · Journal of Applied Physics · 10
Determination of energy modulations of negative oxygen ions during pulsed magnetron sputtering of magnesium oxide
2011 · Th Welzel, Th Dunger, et al. · Plasma Sources Science and Technology · 9
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Characterisation of a BN magnetron sputtering process with an additional aluminium sputter electrode
2002 · Th. Welzel, Th. Pfeifer, et al. · Surface and Coatings Technology · 4
Corrigendum to “Facing-target magnetron operation for the deposition of CN thin films”
2004 · Th. Welzel, F. Richter · Surface and Coatings Technology · 2
Facing-target magnetron operation for the deposition of CNx thin films
2003 · Th. Welzel, F. Richter · Surface and Coatings Technology · 1
Development and implementation of an average Zeff measurement for ASDEX Upgrade plasmas
2016 · Th. Welzel, A. Kappatou, et al. · MPG.PuRe (Max Planck Society)
Works count: 26
Citation count: 476
H-index: 13
I10-index: 18
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