Concept

Capacitively coupled plasma

OpenAlex ID: C68687820

Fabrication of vertically aligned carbon nanowalls using capacitively coupled plasma-enhanced chemical vapor deposition assisted by hydrogen radical injection

2004 · M. Hiramatsu, K. Shiji, et al. · Applied Physics Letters · 373

Two-dimensional modeling of high plasma density inductively coupled sources for materials processing

1994 · Peter L. G. Ventzek, Robert J. Hoekstra, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 342

Two-dimensional model of a capacitively coupled rf discharge and comparisons with experiments in the Gaseous Electronics Conference reference reactor

1995 · J. P. Boeuf, L. C. Pitchford · Physical review. E, Statistical physics, plasmas, fluids, and related interdisciplinary topics · 324

Novel radio-frequency induction plasma processing techniques

1993 · John H. Keller, John C. Forster, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 244

Functional separation of biasing and sustaining voltages in two-frequency capacitively coupled plasma

2000 · T. Kitajima, Y. Takeo, et al. · Applied Physics Letters · 243

The electrical asymmetry effect in capacitively coupled radio frequency discharges – measurements of dc self bias, ion energy and ion flux

2009 · J Schulze, E Schüngel, et al. · Journal of Physics D Applied Physics · 185

Frequency coupling in dual frequency capacitively coupled radio-frequency plasmas

2006 · T. Gans, J. Schulze, et al. · Applied Physics Letters · 182

Pressure Heating of Electrons in Capacitively Coupled rf Discharges

1995 · M. M. Turner · Physical Review Letters · 182

Ion energy distribution control in single and dual frequency capacitive plasma sources

2005 · J K Lee, O V Manuilenko, et al. · Plasma Sources Science and Technology · 177

PDF

Mechanisms for Power Deposition in Ar/SiH4 Capacitively Coupled RF Discharges

1986 · Mark J. Kushner · IEEE Transactions on Plasma Science · 173

Two-Dimensional Self-Consistent Radio-Frequency Plasma Simulations Relevant to the Gaseous Electronics Conference Rf Reference Cell

1995 · D.P. Lymberopoulos, D.J. Economou · Journal of Research of the National Institute of Standards and Technology · 170

PDF

Inductive plasmas for plasma processing

1996 · John H Keller · Plasma Sources Science and Technology · 159

Tailored-waveform excitation of capacitively coupled plasmas and the electrical asymmetry effect

2015 · T Lafleur · Plasma Sources Science and Technology · 155

Vertical growth of carbon nanowalls using rf plasma-enhanced chemical vapor deposition

2004 · K. Shiji, M. Hiramatsu, et al. · Diamond and Related Materials · 140

Plasma damage mechanisms for low-k porous SiOCH films due to radiation, radicals, and ions in the plasma etching process

2008 · Saburo Uchida, Seigo Takashima, et al. · Journal of Applied Physics · 138

Investigation of electron source and ion flux uniformity in high plasma density inductively coupled etching tools using two-dimensional modeling

1994 · Peter L. G. Ventzek, Michael Grapperhaus, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 138

Numerical investigation of ion-energy-distribution functions in single and dual frequency capacitively coupled plasma reactors

2004 · V. Georgieva, A. Bogaerts, et al. · Physical Review E · 136

Dynamics of collisionless rf plasma sheaths

1997 · Paul A. Miller, Merle E. Riley · Journal of Applied Physics · 136

The electrical asymmetry effect in multi-frequency capacitively coupled radio frequency discharges

2011 · J Schulze, E Schüngel, et al. · Plasma Sources Science and Technology · 135

Collisionless Bounce Resonance Heating in Dual-Frequency Capacitively Coupled Plasmas

2011 · Yong-Xin Liu, Quan-Zhi Zhang, et al. · Physical Review Letters · 134

Space and phase resolved plasma parameters in an industrial dual-frequency capacitively coupled radio-frequency discharge

2007 · J Schulze, T Gans, et al. · Journal of Physics D Applied Physics · 134

Strong Ionization Asymmetry in a Geometrically Symmetric Radio Frequency Capacitively Coupled Plasma Induced by Sawtooth Voltage Waveforms

2015 · Bastien Bruneau, Timo Gans, et al. · Physical Review Letters · 132