Work

Material Stack Design With High Tolerance to Process-Induced Damage in Domain Wall Motion Device

Year: 2014

Type: article

Source: IEEE Transactions on Magnetics

DOI: 10.1109/tmag.2014.2325019

Authors: Hiroaki Honjo, Shunsuke Fukami, Kunihiko Ishihara, Keizo Kinoshita, Yukihide Tsuji, Ayuka Morioka, Ryusuke Nebashi, Keiichi Tokutome, Noboru Sakimura, Michio Murahata, Sadahiko Miura, Tadahiko Sugibayashi, Naoki Kasai, Hideo Ohno

Institutions: NEC (Japan), Tohoku University, Research Institute of Electrical Communication, Tohoku University, Advanced Institute for Materials Research, Tohoku University

Language: English

Topic: Magnetic properties of thin films

Subfield: Condensed Matter Physics

Field: Physics and Astronomy

Domain: Physical Sciences

Open Access status: closed

Funder: Japan Society for the Promotion of Science

OpenAlex ID: W2320005811

FWCI: 0.482

Cites: 12

Cited by: 7

Related to: 10