Work

Advanced Spectroscopic Ellipsometry Application for Multi-Layers Sige At 28nm Node and Beyond

Year: 2013

Type: conference-abstract

Source: ECS Meeting Abstracts

DOI: 10.1149/ma2013-02/31/2153

Authors: Teng-Chun Hsuan, Yi-Cheng Hu, Single Hsu, Dian-Zhen Zhan, Avery Lin, Stan Yu, Chin-Cheng Chien, Shao-Ju Chang, Sheng-Min Chiu, Chien-Jen Huang, Chao-Yu Cheng, Juli Cheng, Getin Raphael, Zhiming Jiang, Ygartua Carlos, Zhengquan Tan

Institutions: United Microelectronics (United States), KLA (United States)

Language: English

Topic: Semiconductor materials and interfaces

Subfield: Electronic, Optical and Magnetic Materials

Field: Materials Science

Domain: Physical Sciences

Open Access status: bronze

OpenAlex ID: W4249658902

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