Get started
Author

K. Iwadate

Observed names: KAZUMI IWADATE, Kazumi IWADATE, Kazumi Iwadate, Kazumi Iwadate Kazumi Iwadate
OpenAlex ID: A5012713041
Size dependence of the characteristics of Si single-electron transistors on SIMOX substrates
1996 · Y. Takahashi, H. Namatsu, et al. · IEEE Transactions on Electron Devices · 195
Dimensional limitations of silicon nanolines resulting from pattern distortion due to surface tension of rinse water
1995 · Hideo Namatsu, Kenji Kurihara, et al. · Applied Physics Letters · 127
Fabrication of a silicon quantum wire surrounded by silicon dioxide and its transport properties
1994 · Y. Nakajima, Y. Takahashi, et al. · Applied Physics Letters · 70
Fabrication of sub-10-nm silicon lines with minimum fluctuation
1995 · H. Namatsu, M. Nagase, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 58
An Electron Beam Nanolithography System and its Application to Si Nanofabrication
1995 · Kenji Kurihara, Kazumi Iwadate, et al. · Japanese Journal of Applied Physics · 57
PDF
Metrology of Atomic Force Microscopy for Si Nano-Structures
1995 · Masao Nagase Masao Nagase, Hideo Namatsu Hideo Namatsu, et al. · Japanese Journal of Applied Physics · 51
PDF
Nano-scale fluctuations in electron beam resist pattern evaluated by atomic force microscopy
1996 · M. Nagase, H. Namatsu, et al. · Microelectronic Engineering · 50
Silicon single-electron devices
1999 · YASUO TAKAHASHI, AKIRA FUJIWARA, et al. · International Journal of Electronics · 33
10-nm silicon lines fabricated in (110) silicon
1995 · H. Namatsu, M. Nagase, et al. · Microelectronic Engineering · 28
Quantized Conductance of a Silicon Wire Fabricated by Separation-by-Implanted-Oxygen Technology
1995 · Yasuyuki Nakajima Yasuyuki Nakajima, Yasuo Takahashi Yasuo Takahashi, et al. · Japanese Journal of Applied Physics · 25
Si nanostructures fabricated by electron beam lithography combined with image reversal process using electron cyclotron resonance plasma oxidation
1995 · K. Kurihara, K. Iwadate, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 20
Transport properties of silicon nanostructures fabricated on SIMOX substrates
1995 · Katsumi Murase, Yasuo Takahashi, et al. · Microelectronic Engineering · 16
Temperature Dependence of the Phase Coherence Length of High-Mobility AlGaAs/GaAs Quantum-Wire Rings
1991 · Kimihisa Aihara, Masafumi Yamamoto, et al. · Japanese Journal of Applied Physics · 14
A novel high-speed nanometric electron beam lithography system: EB–F
1987 · Kazumi Iwadate, Ryoichi Yamaguchi, et al. · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 10
Electron beam nanolithography with image reversal by ECR plasma oxidation
1995 · K. Kurihara, K. Iwadate, et al. · Microelectronic Engineering · 6
High precision lithography for submicron VLSI fabrication
1982 · T. Matsuda, K. Iwadate, et al. · Technical digest - International Electron Devices Meeting/Technical digest · 6
Influence of patterning in silicon quantum well structures on photoluminescence
1996 · Hideo Namatsu, Tomofumi Furuta, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 5
Si Single-Electron Transistors on SIMOX Substrates
1996 · Yasuo Takahashi, Akira Fujiwara, et al. · IEICE Transactions on Electronics · 4
Subquarter-Micrometer P-Channel MOSFET's with 80 Nm S/D Junctions
1987 · M. Miyake, Takashi Kobayashi, et al. · Symposium on VLSI Technology · 4
Si Single-Electron Transistors on SIMOX Substrates (Special Issue on Quantum Effect Devices and Their Fabrication Technologies)
1996 · Yasuo Takahashi, Akira Fujiwara, et al. · IEICE Transactions on Electronics · 3
Photoluminescence from oxidized silicon nano-lines
1996 · H. Namatsu, T. Furuta, et al. · Microelectronic Engineering · 3
Novel Fabrication Technique for a Si Single-Electron Transistor and Its High Temperature Operation
1995 · Yasuo TAKAHASHI, Masao NAGASE, et al. · International Conference on Solid State Devices and Materials (SSDM) · 3
Quantized Conductance of a Silicon Wire Fabricated Using SIMOX Technology
1994 · Y. Nakajima, Y. Takahashi, et al. · International Conference on Solid State Devices and Materials (SSDM) · 3
Direct Electron Beam Data Writing Technology for 128K EB-ROM
1979 · Eisuke Arai, Tadamasa Ogawa, et al. · Japanese Journal of Applied Physics · 3
PDF
Electron beam/optical intralevel mix-and-match lithography for deep submicron device fabrication
1990 · Tadahito Matsuda, Kazumi Iwadate, et al. · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 2
Works count: 28
Citation count: 797
H-index: 13
I10-index: 14
Year
Topic
Type