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Author

Monika Boettcher

Observed names: M. Boettcher, M. Bo¨ttcher
Observed institution: Vistec Electron Beam (Germany)
OpenAlex ID: A5048654849
High resolution variable-shaped beam direct write
2007 · Peter Hahmann, Lutz Bettin, et al. · Microelectronic Engineering · 18
Determination of best focus and optimum dose for variable shaped e-beam systems by applying the isofocal dose method
2008 · Katja Keil, Kang-Hoon Choi, et al. · Microelectronic Engineering · 14
Direct comparison of the performance of commonly used e-beam resists during nano-scale plasma etching of Si, SiO2, and Cr
2015 · Andy Goodyear, Monika Boettcher, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7
Modified dose correction strategy for better pattern contrast
2010 · R. Galler, D. Melzer, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6
High resolution patterning – Preparation of VSB systems for 22nm node capability
2009 · Peter Hahmann, Monika Boettcher, et al. · Microelectronic Engineering · 5
Electron beam direct write: shaped beam overcomes resolution concerns
2007 · Ines Stolberg, Laurent Pain, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Evaluation of most recent chemically amplified resists for high resolution direct write using a Leica SB350 variable shaped beam writer
2006 · Anatol Schwersenz, Dirk Beyer, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
60-nm copper lines produced by a lift-off technique with 5-keV electrons: experiment and simulation
1997 · Ulrich A. Jagdhold, Lothar Bauch, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Diffusion limitations in high-resolution lithography
1996 · Lothar Bauch, Ulrich A. Jagdhold, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Experiment and simulation of e-beam direct writing over topography
1996 · Ulrich A. Jagdhold, Lothar Bauch, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Resist process to join electron beam lithography and photolithography
1995 · L. Bauch, M. Bo¨ttcher, et al. · Microelectronic Engineering · 1
MSB for ILT masks
2011 · Juergen Gramss, Ulf Weidenmueller, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Resist Processes for High Resolution Mask and Direct Write Applications Using the Latest Vistec VSB Electron Column
2007 · H. Sailer, M. Irmscher, et al. · International Microprocesses and Nanotechnology Conference (MNC)
Advantageous Exposure of X Architecture Patterns when Using a Variable-Shaped Beam Tool
2004 · Monika Boettcher, Juergen Gramss, et al. · Japanese Journal of Applied Physics
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Advantageous exposure of X architecture pattern when using a variable shaped beam tool
2004 · W. Dorl, M. Boettcher, et al. · International Microprocesses and Nanotechnology Conference (MNC)
Low-voltage electron-beam lithography linked to photolithography
1995 · Lothar Bauch, Monika Boettcher, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Combination of transmission and absorption mask for 0.3-um lithography
1994 · Lothar Bauch, Joachim J. Bauer, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Chromeless phase mask by resist silylation for i-line lithography
1993 · Lothar Bauch, Joachim J. Bauer, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Silylation and dry development of e-beam resist
1993 · Lothar Bauch, Monika Boettcher, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Works count: 19
Citation count: 61
H-index: 5
I10-index: 2
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