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Thomas L. Laidig

Observed name: Thomas Laidig
OpenAlex ID: A5059811760
Practical method for full-chip optical proximity correction
1997 · J. Fung Chen, Thomas L. Laidig, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 43
Contact hole reticle optimization by using interference mapping lithography (IML)
2004 · Robert J. Socha, Douglas J. Van Den Broeke, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 29
Practical technology path to sub-0.10-μm process generations via enhanced optical lithography
1999 · J. Fung Chen, Thomas L. Laidig, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 15
Assessment of a hypothetical roadmap that extends optical lithography through the 70-nm technology node
1998 · John S. Petersen, Martin McCallum, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 15
Dipole decomposition mask design for full-chip implementation at 100-nm technology node and beyond
2002 · Stephen Hsu, Noel P. Corcoran, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 14
Contact hole reticle optimization by using interference mapping lithography (IML)
2004 · Robert J. Socha, Douglas J. Van Den Broeke, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 13
Complex 2D pattern lithography at λ/4 resolution using chromeless phase lithography (CPL)
2002 · Douglas J. Van Den Broeke, J. Fung Chen, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 13
Binary halftone chromeless PSM technology for λ/4;optical lithography
2001 · J. Fung Chen, John S. Petersen, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 13
Design of 200-nm, 170-nm, and 140-nm DUV contact sweeper high-transmission attenuating phase-shift mask through simulation I
1998 · Robert J. Socha, John S. Petersen, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 11
Resolution enhancement with high-transmission attenuating phase-shift masks
1999 · Robert J. Socha, Will Conley, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 10
Development of a computational lithography roadmap
2008 · J. Fung Chen, Hua-Yu Liu, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 9
65-nm full-chip implementation using double dipole lithography
2003 · Stephen D. Hsu, J. Fung Chen, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 9
Designing dual-trench alternating phase-shift masks for 140-nm and smaller features using 248-nm KrF and 193-nm ArF lithography
1998 · John S. Petersen, Robert J. Socha, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7
Digital lithography
2025 · Chi-Ming Tsai, Thomas L. Laidig, et al. · SPIE Optical and EUV Nanolithography · 6
RET integration of CPL technology for random logic
2004 · Stephen D. Hsu, Douglas J. Van Den Broeke, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6
Application of CPL reticle technology for the 65- and 50-nm node
2003 · Will Conley, Douglas J. Van Den Broeke, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
OPC technology road map to 0.14-μm design rules
1997 · J. Fung Chen, Thomas L. Laidig, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Experimental verification of a model-based decomposition method for double dipole lithography
2004 · Mark Eurlings, Stephen D. Hsu, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Mask design optimization for 70-nm technology node using chromeless phase lithography (CPL) based on 100% transmission phase-shifting mask
2002 · J. Fung Chen, Douglas J. Van Den Broeke, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Design of 200-nm, 170-nm, and 140-nm DUV contact sweeper high-transmission attenuating phase-shift mask: II. Experimental results
1999 · Robert J. Socha, Xuelong Shi, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Development of a sub-100-nm integrated imaging system using chromeless phase-shifting imaging with very high NA KrF exposure and off-axis illumination
2002 · John S. Petersen, Will Conley, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Halftone biasing OPC technology: an approach for achieving fine bias control on raster-scan systems
1999 · Kent H. Nakagawa, J. Fung Chen, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Double dipole lithography for 65-nm node and beyond: a technology readiness review
2004 · Stephen D. Hsu, Mark Eurlings, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Application of CPL with Interference Mapping Lithography to generate random contact reticle designs for the 65-nm node
2004 · Douglas J. Van Den Broeke, Thomas L. Laidig, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
The application of CPL reticle technology for the 0.045-mm node
2004 · Will Conley, Douglas J. Van Den Broeke, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Works count: 42
Citation count: 239
H-index: 10
I10-index: 10
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