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Wim de Boeij
Observed name:
Wim De Boeij
Institution:
ASML (Netherlands)
Observed institutions:
ASML (Netherlands),
University of Twente
OpenAlex ID:
A5069910606
Full optical column characterization of DUV lithographic projection tools
2004
·
Mark A. van de Kerkhof
, Wim de Boeij
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
60
New paradigm in lens metrology for lithographic scanner: evaluation and exploration
2004
·
Kafai Lai
, Gregg M. Gallatin
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
27
From performance validation to volume introduction of ASML's NXE platform
2012
·
Hans Meiling
, Wim de Boeij
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
26
Optimizing and enhancing optical systems to meet the low k 1 challenge
2003
·
Donis G. Flagello
, Robert J. Socha
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
24
Modeling polarization for hyper-NA lithography tools and masks
2007
·
Kafai Lai
, Alan E. Rosenbluth
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
17
Immersion lithography with an ultrahigh-NA in-line catadioptric lens and a high-transmission flexible polarization illumination system
2006
·
Hans Jasper
, Theo Modderman
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
17
Pushing the boundary: low-k1 extension by polarized illumination
2007
·
Eelco van Setten
, Wim de Boeij
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
14
NXT:1980Di immersion scanner for 7nm and 5nm production nodes
2016
·
Roelof de Graaf
, Stefan Weichselbaum
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
13
Enabling the 45nm node by hyper-NA polarized lithography
2006
·
Wim de Boeij
, Geert Swinkels
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
11
Imaging enhancements by polarized illumination: theory and experimental verification
2005
·
Carsten Kohler
, Wim de Boeij
, et al.
·
Optical Microlithography XVIII
·
11
On-scanner high-spatial-frequency overlay control using a distortion manipulator
2022
·
Friso Klinkhamer
, Bart Smeets
, et al.
·
SPIE Optical and EUV Nanolithography
·
8
Mask substrate birefringence requirements for hyper-NA lithography
2006
·
Mark van de Kerkhof
, Wim de Boeij
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
8
Application of the aberration ring test (ARTEMIS) to determine lens quality and predict its lithographic performance
2001
·
Marco H. P. Moers
, Hans van der Laan
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
6
Extending KrF lithography beyond 80nm with the TWINSCAN XT:1000H 0.93NA scanner
2008
·
Wim de Boeij
, Gerald Dicker
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
5
Supporting future DRAM overlay and EPE roadmaps with the NXT:2100i
2023
·
Bart Smeets
, Paul Aben
, et al.
·
SPIE Optical and EUV Nanolithography
·
3
The impact of mask birefringence on hyper-NA (NA>1.0) polarized imaging
2005
·
Bernd Geh
, Donis G. Flagello
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
3
Extending DUV productivity and overlay through joint dry and immersion scanner advancements
2021
·
Bart Paarhuis
, Wim De Boeij
, et al.
·
SPIE Optical Microlithography
·
2
A novel projection lens manipulator for high frequent overlay tuning
2020
·
Thilo Pollak
, Wolfgang Emer
, et al.
·
SPIE Optical Microlithography
·
2
Cost-effective shrink of semi-critical layers using the TWINSCAN XT:1000H NA 0.93 KrF scanner
2009
·
Frank Bornebroek
, Marten de Wit
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
1
Polarization-sensitive coherent Raman spectroscopy of proteins in solutions
1993
·
Gerald W. Lucassen
, Wim de Boeij
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
1
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Works count:
20
Citation count:
259
H-index:
10
I10-index:
10
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