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J.‐E. Sundgren

Observed names: J -E Sundgren, J -E. Sundgren, J E Sundgren, J E. Sundgren, J-E Sundgren, J-E. Sundgren, J. -E. Sundgren, J. E. Sundgren, J.-E Sundgren, J.-E. Sundgren, J.E. Sundgren, J.‐E. SUNDGREN, J.–E. Sundgren, Jan-Eric Sundgren, Jan-Eric Sundgren,, Jan‐Eric Sundgren, J‐E. Sundgren
Observed institutions: Linköping University, Uppsala University, University of Illinois Urbana-Champaign, Hauzer (Netherlands), Seco Tools (Sweden), Chalmers University of Technology
OpenAlex ID: A5111537154
Structure and properties of TiN coatings
1985 · J.-E. Sundgren · Thin Solid Films · 926
Growth of single-crystal TiN/VN strained-layer superlattices with extremely high mechanical hardness
1987 · U. Helmersson, S. Todorova, et al. · Journal of Applied Physics · 764
Superhard and Elastic Carbon Nitride Thin Films Having Fullerenelike Microstructure
1995 · H. Sjöström, S. Stafström, et al. · Physical Review Letters · 664
Oxidation of metastable single-phase polycrystalline Ti0.5Al0.5N films: Kinetics and mechanisms
1990 · D. McIntyre, J. E. Greene, et al. · Journal of Applied Physics · 542
Thin Films Stresses and Mechanical Properties VI
1996 · W. W. Gerberich, Han Gao, et al. · 508
A review of the present state of art in hard coatings grown from the vapor phase
1986 · J.-E. Sundgren, H. T. G. Hentzell · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 489
Role of nitrogen in the formation of hard and elastic CN x thin films by reactive magnetron sputtering
1999 · Niklas Hellgren, Mats P. Johansson, et al. · Physical review. B, Condensed matter · 472
Development of preferred orientation in polycrystalline TiN layers grown by ultrahigh vacuum reactive magnetron sputtering
1995 · J. E. Greene, J.-E. Sundgren, et al. · Applied Physics Letters · 399
Microstructure modification of TiN by ion bombardment during reactive sputter deposition
1989 · I. Petrov, L. Hultman, et al. · Thin Solid Films · 328
Mechanisms of reactive sputtering of titanium nitride and titanium carbide II: Morphology and structure
1983 · J.-E. Sundgren, B.-O. Johansson, et al. · Thin Solid Films · 285
Nanoindentation studies of single-crystal (001)-, (011)-, and (111)-oriented TiN layers on MgO
1996 · H. Ljungcrantz, M. Odén, et al. · Journal of Applied Physics · 252
Growth of poly- and single-crystal ScN on MgO(001): Role of low-energy N2+ irradiation in determining texture, microstructure evolution, and mechanical properties
1998 · D. Gall, I. Petrov, et al. · Journal of Applied Physics · 248
High-flux low-energy (≂20 eV) N+2 ion irradiation during TiN deposition by reactive magnetron sputtering: Effects on microstructure and preferred orientation
1995 · L. Hultman, J.-E. Sundgren, et al. · Journal of Applied Physics · 245
Polycrystalline TiN films deposited by reactive bias magnetron sputtering: Effects of ion bombardment on resputtering rates, film composition, and microstructure
1992 · I. Petrov, L. Hultman, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 244
Microstructure and physical properties of polycrystalline metastable Ti0.5Al0.5N alloys grown by d.c. magnetron sputter deposition
1987 · G. Håkansson, J.-E. Sundgren, et al. · Thin Solid Films · 243
Average energy deposited per atom: A universal parameter for describing ion-assisted film growth?
1993 · I. Petrov, F. Adibi, et al. · Applied Physics Letters · 228
Structural and mechanical properties of carbon nitride CNx (0.2⩽x⩽0.35) films
1996 · H. Sjöström, L. Hultman, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 225
Crystal growth and microstructure of polycrystalline Ti1−xAlxN alloy films deposited by ultra-high-vacuum dual-target magnetron sputtering
1993 · U. Wahlström, L. Hultman, et al. · Thin Solid Films · 213
Growth and properties of single crystal TiN films deposited by reactive magnetron sputtering
1985 · B. O. Johansson, J.-E. Sundgren, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 207
Synthesis of metastable epitaxial zinc-blende-structure AlN by solid-state reaction
1992 · I. Petrov, E. Mojab, et al. · Applied Physics Letters · 195
Mechanisms of reactive sputtering of titanium nitride and titanium carbide I: Influence of process parameters on film composition
1983 · J.-E. Sundgren, B.-O. Johansson, et al. · Thin Solid Films · 184
Reactive magnetron sputter deposited CNx: Effects of N2 pressure and growth temperature on film composition, bonding, and microstructure
1996 · W. T. Zheng, H. Sjöström, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 179
Effects of high-flux low-energy (20–100 eV) ion irradiation during deposition on the microstructure and preferred orientation of Ti0.5Al0.5N alloys grown by ultra-high-vacuum reactive magnetron sputtering
1993 · F. Adibi, I. Petrov, et al. · Journal of Applied Physics · 169
Influence of residual stresses on the mechanical properties of TiCxN1–x (x=0, 0.15, 0.45) thin films deposited by arc evaporation
2000 · L Karlsson, L Hultman, et al. · Thin Solid Films · 166
Growth, microstructure, and mechanical properties of arc evaporated TiCxN1−x (0≤x≤1) films
2000 · L. Karlsson, L. Hultman, et al. · Surface and Coatings Technology · 163
Works count: 250
Citation count: 15,950
H-index: 63
I10-index: 170
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